A Diamond Field-Effect Transistor with Air-Bridge-Like Source-Field Plate Structure
A field effect transistor and source field plate technology, applied in the field of diamond field effect transistors, can solve the problems of reducing the operating frequency, power gain, etc., and achieves improving the power gain and operating frequency, increasing the breakdown voltage, and reducing the gate-drain feedback capacitance. Effect
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[0034] use image 3 Shown is a diamond field effect transistor with an air bridge type source field plate structure. The substrate layer 1 is crystal-oriented single-crystal diamond with a thickness of 1.9 μm; the epitaxial layer 2 is crystal-oriented single-crystal diamond with a thickness of 100 nm, a gate-source distance of 0.2 μm, a gate-drain distance of 1 μm, and a gate length of 0.2 μm. , the passivation layer 7, the gate dielectric layer 3 and the support layer 10 of the source field plate 8 on the gate electrode are all aluminum oxide, but the thickness of the passivation layer 7 in the gate source region and the passivation layer 7 in the gate drain region are different, respectively The thicknesses of the gate dielectric layer 3 and the support layer 10 of the source field plate on the gate electrode are 10nm and 320nm respectively. The distance between the bottom of the source field plate 8 of the gate and drain region and the passivation layer 7 is 10 nm, with an...
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