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Positive photosensitive resin composition, and insulating film, and image display device

A technology of photosensitive resin and composition, which is applied in the field of insulating film and positive photosensitive resin composition, and can solve the problems of failure to provide mechanical properties and developability

Active Publication Date: 2020-02-28
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] For example, Korean Laid-Open Patent No. 2013-0021324 discloses a positive resist composition, but fails to provide a solution for improving the above-mentioned mechanical properties and developability

Method used

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  • Positive photosensitive resin composition, and insulating film, and image display device
  • Positive photosensitive resin composition, and insulating film, and image display device
  • Positive photosensitive resin composition, and insulating film, and image display device

Examples

Experimental program
Comparison scheme
Effect test

experiment example

[0235] The following evaluation was performed about the photosensitive composition manufactured by the Example and the comparative example of Table 1, and the result is described in following Table 2.

[0236] (1) Sensitivity determination

[0237] On a glass substrate (Corning 1737, manufactured by Corning Corporation) with a thickness of 0.7 mm, utilize a spin coater (Spinner) to coat the photosensitive resin compositions of Examples and Comparative Examples respectively, and heat on a heating plate at 100° C. for 125 seconds The solvent was evaporated to form a pre-insulation layer with a thickness of 4.0 μm.

[0238] Thereafter, in order to obtain a contact hole pattern with a diameter of 10 μm, exposure was performed with a mask aligner (Karl suss, MA6) using a mask having a quadrilateral pattern opening with an exposure portion having a side of 10 μm.

[0239] The exposed substrate was developed with 2.38% tetramethylammonium hydroxide aqueous solution as a developer at...

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Abstract

The invention provides a positive photosensitive resin composition, an insulating film, and an image display device. The positive photosensitive resin composition includes a binder resin, an antioxidant, a photoacid generator, and a solvent. The binder resin includes a first resin including a structural unit represented by the following chemical formula 1. In Chemical Formula 1, R1, R2 and R3 arehydrogen or methyl, R4 is an alkylene group having 1-5 carbon atoms, R is independently an alkyl group having 1-4 carbon atoms, a is 20-40 mol%, b is 30-60 mol%, and c is 5-40 mol%. Through interaction between the binder resin and the antioxidant, an insulating film having improved adhesion and developability can be formed. Chemical formula 1.

Description

technical field [0001] The present invention relates to a positive photosensitive resin composition and an insulating film produced therefrom. More specifically, it is related with the insulating film produced from the positive photosensitive resin composition containing a photosensitive resin and a photoacid generator, and it. Background technique [0002] For example, photosensitive resin compositions are used to form various photocurable insulating patterns such as photoresists, insulating films, protective films, black matrices, and columnar spacers of display devices. For example, inorganic insulating films such as silicon oxides and silicon nitrides have high dielectric constants, so there is an increasing demand for low-dielectric organic insulating films. To form the above-mentioned organic insulating films, the above-mentioned photosensitive resin composition can be used. [0003] The above-mentioned organic insulating film can be formed into a predetermined patter...

Claims

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Application Information

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IPC IPC(8): G03F7/075G03F7/004
CPCG03F7/0758G03F7/004G03F7/039G03F7/033C09K15/06H01B3/447
Inventor 郑盛旭任玟柱赵庸桓
Owner DONGWOO FINE CHEM CO LTD
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