Collagen nano instant facial mask of yeast recombinant collagen and preparation method of facial mask
A technology for recombining collagen and collagen nano-technology, which is applied in skin care preparations, pharmaceutical formulas, cosmetic preparations, etc., can solve the problem of unsolved problems such as the similarity between effective nursing ingredients and human collagen sequences, and achieve small pore size and high porosity. High, large specific surface area effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0100] Prepare facial mask of the present invention as follows:
[0101] (1) Preparation of spinning solution: use pure water as solvent, add yeast recombinant collagen (purchased from Jiangsu Yuezhi Biomedical Co., Ltd.), sodium hyaluronate, maltooligosaccharide glucoside, hydrogenated starch hydrolyzate, PEG- 7M, PEG-180, polyglyceryl-10 myristate, pullulanase polysaccharide, preservative, stirred in a constant temperature water bath at 20°C-50°C for 2-6 hours until the solution is uniform and free of particles, and the following Component spinning solution: 18wt% yeast recombinant collagen, 0.2wt% sodium hyaluronate, 2.0wt% pullulanase polysaccharide, 2.4wt% maltooligoglucoside, 1.4wt% hydrogenated starch Hydrolyzate, 0.5wt% of PEG-7M, 0.3wt% of PEG-180, 0.1wt% of polyglycerol-10 myristate, and 1.0wt% of preservatives, wherein the average sodium hyaluronate used The molecular weight is about 30,000, the average molecular weight of the yeast recombinant collagen used is abo...
Embodiment 2
[0104] The facial mask is prepared in the same steps and manner as in Example 1, but the prepared spinning solution comprises the following components: 10wt% yeast recombinant collagen, 3wt% sodium hyaluronate, 1.0wt% pullulanase polysaccharide, 0.5wt% maltooligosaccharide glucoside, 0.5wt% hydrogenated starch hydrolyzate, 0.5wt% PEG with high degree of polymerization, 5wt% PEG with low degree of polymerization, 5.0wt% polysorbate-20, and 0.1wt% preservative, wherein the average molecular weight of the yeast recombinant collagen used is about 40-80Kda, the average molecular weight of the sodium hyaluronate used is about 25000, the molecular weight of the pullulanase polysaccharide used is 250000, and the used The average molecular weight of the PEG with a high degree of polymerization is about 250,000, and the average molecular weight of the PEG with a low degree of polymerization is about 10,000.
Embodiment 3
[0106] The facial mask is prepared in the same steps and manner as in Example 1, but the prepared spinning solution comprises the following components: 5wt% yeast recombinant collagen, 5wt% sodium hyaluronate, 5.0wt% pullulanase polysaccharide, 3wt% of maltooligosaccharide glucoside, 1.7wt% of hydrogenated starch hydrolyzate, 1wt% of PEG with high degree of polymerization, 2wt% of PEG with low degree of polymerization, 0.2wt% of sucrose laurate, and 2.0wt% of Preservatives, wherein the average molecular weight of the yeast recombinant collagen used is about 40-80Kda, the average molecular weight of the sodium hyaluronate used is about 50,000, the molecular weight of the pullulanase polysaccharide used is 150,000, and the high degree of polymerization used The average molecular weight of the PEG used is about 350,000, and the average molecular weight of the PEG with a low degree of polymerization used is about 9,000.
PUM
Property | Measurement | Unit |
---|---|---|
Average molecular weight | aaaaa | aaaaa |
Average molecular weight | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com