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A compound texturizing liquid additive formula for preparing fine and dense pyramid monocrystalline silicon texture

A technology of texturing liquid and additives, applied in the direction of single crystal growth, single crystal growth, crystal growth, etc., can solve the problems of environmental pollution, volatile alcohol substances, unsatisfactory texture, etc., and achieve no harm to the human body and the environment. , No danger of burning and explosion, the effect of improved texturing effect

Active Publication Date: 2022-06-24
HUNAN INSTITUTE OF SCIENCE AND TECHNOLOGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The traditional texturizing solutions for monocrystalline silicon textures include NaOH and IPA systems. The advantages of these reagents are that the process is mature and easy to control; the disadvantages are that alcohols are volatile, expensive, and pollute the environment.
Sodium silicate is used as the texturing liquid, and does not require additives such as IPA, and the cost is low; but the time for texturing is too long, the prepared suede is not ideal, and the repeatability is not good
The mixed solution of sodium carbonate and sodium bicarbonate is used as a texturing solution, which is cheap and mild in reaction; but the crystallization temperature of carbonate is relatively high, which brings inconvenience to industrial production

Method used

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  • A compound texturizing liquid additive formula for preparing fine and dense pyramid monocrystalline silicon texture
  • A compound texturizing liquid additive formula for preparing fine and dense pyramid monocrystalline silicon texture
  • A compound texturizing liquid additive formula for preparing fine and dense pyramid monocrystalline silicon texture

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Take the following steps in the texturing process: 1) Additive preparation: with 1L deionized water as solvent, add 3.0g of imidazolinyl urea, 5.0g of glucose, 12.0g of PEG600, 3.0g of benzoic acid, 2.0g of NaBr and Na 2 SiO 34.0g was fully stirred and dissolved; 2) Preparation of texturing solution: 40.0 mL of NaOH solution with a concentration of 30% by weight was added to 1 L of deionized water, and 15.0 mL of additives were added to obtain an alkaline texturing solution; 3) the cut After the monocrystalline silicon wafer is pre-cleaned, immerse it in the texturing solution, the temperature of the texturing solution is 85°C, and the texturing time is 12 minutes; Wash in water, dry the product in a drying oven to obtain a textured monocrystalline silicon wafer. The size of the pyramids formed on the surface of the monocrystalline silicon wafer is between 0.5-2 μm. The amount of silicon wafers is 3.5%.

Embodiment 2

[0028] Take the following steps in the texturing process: 1) Additive preparation: with 1L deionized water as solvent, add 2-phenylimidazoline 4.0g, fructose 3.0g, PEG800 14.0g, terephthalic acid 4.0g, NaCl 3.0g and Na 2 SiO 3 5.0g was fully stirred and dissolved; 2) preparation of texturing solution: 35.0mL of NaOH solution with a concentration of 30% by weight was added to 1 L of deionized water, and 20.0mL of additives were added to obtain an alkaline texturing solution; 3) the cut After pre-cleaning the monocrystalline silicon wafer, immerse it in the texturing solution, the temperature of the texturing solution is 82°C, and the texturing time is 15 minutes; 4) Clean the monocrystalline silicon wafer after texturing with mixed acid and then use deionized Washing in water, drying the product in a drying oven to obtain a textured monocrystalline silicon wafer.

Embodiment 3

[0030] Take the following steps in the texturing process: 1) Additive preparation: with 1L deionized water as solvent, add 5.0g of 2-benzyl imidazoline, 4.0g of galactose, 10.0g of PEG10000, 2.0g of benzenesulfonic acid, 3.0g of NaI and NaI 2 SiO 3 3.0g was fully stirred and dissolved; 2) preparation of texturing solution: 42.0mL of NaOH solution with a concentration of 30% by weight was added to 1 L of deionized water, and 22.0mL of additives were added to obtain an alkaline texturing solution; 3) the cut After the monocrystalline silicon wafer is pre-cleaned, immerse it in the texturing solution. The temperature of the texturing solution is 87°C, and the texturing time is 10 minutes; Washing in water, drying the product in a drying oven to obtain a textured monocrystalline silicon wafer.

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Abstract

The invention relates to an additive for monocrystalline silicon texturing liquid. The components of the additive include polyvinylpyrrolidone (PVP), diol, benzene-containing organic acid salt, sodium silicate and deionized water. Among them, PVP is a mixture of one or more of PVP‑K12, PVP‑K15, PVP‑K17, PVP‑K25, PVP‑K30, and the weight ratio to water is 0.2‑1.0:100; A mixture of one or more of ethylene glycol, triethylene glycol, tetraethylene glycol, dipropylene glycol and tripropylene glycol, with a weight ratio of 1.0‑3.0:100 to water; containing benzene Organic acid salt is a mixture of one or more of sodium benzoate, potassium benzoate, sodium phenylacetate, sodium terephthalate and sodium isophthalate, with a weight ratio of 0.1‑1.0:100 to water; sodium silicate and water The weight ratio is 0.1‑1.0:100. The formula of the monocrystalline silicon surface texturing agent is: add 25.0-45.0 mL of NaOH solution with a concentration of 30% by weight in 1 L of deionized water, and add 10.0-20.0 mL of this additive.

Description

technical field [0001] The invention belongs to the technical field of surface treatment of solar cell monocrystalline silicon wafers, and relates to a method containing imidazoline-type surfactants, sugars, polyethylene glycol, organic acids, and inorganic salts, and the type and content of the monocrystalline silicon wafers for texturing effect influences. Background technique [0002] Throughout the history of human evolution, energy and development are inseparable. In the early days, the energy supply was far greater than the energy demand. Combustible materials were the main energy sources at that time, and due to the small population, combustible energy was sufficient to meet human needs. After the first economic revolution, settled agriculture emerged, and land began to be gradually privatized. As combustible energy is gradually privatized and put into market transactions, the energy at this time can better meet the energy needs of households. Although obtaining en...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B33/10C30B29/06
CPCC30B33/10C30B29/06
Inventor 张丽陈婉君卢建红阎建辉杨海华邓小梅王迎益刘襄
Owner HUNAN INSTITUTE OF SCIENCE AND TECHNOLOGY
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