A kind of in-situ self-generated aluminum-silicon gradient composite material and preparation method thereof
A composite material, in-situ self-generating technology, applied in the direction of semiconductor/solid-state device components, electric solid-state devices, semiconductor devices, etc. Processed molding, low density effect
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Embodiment 1
[0038] (1) Place the high-purity silica quartz glass vessel with the same workpiece shape in a heating furnace and heat it to 800 o C preheating and heat preservation;
[0039] (2) will be 800 o C pure aluminum liquid is poured into step (1) in the high-purity silica quartz glass vessel, leaves standstill at 800 o C insulation;
[0040] (3) Control the holding time of step (2) for 2 hours to ensure that the aluminum liquid and silicon dioxide react, the silicon atoms diffuse into the aluminum liquid, and finally cool with the furnace;
[0041] (4) Removing the residual quartz glass on the surface of the material in step (3) to obtain an in-situ self-generated aluminum-silicon gradient composite material consistent with the shape of the quartz glass vessel.
[0042] (5) Macro organization see figure 2 , massive primary silicon is distributed in the outer ring; the mosaic diagram of the microstructure from outside to inside image 3 , it can be clearly seen that the layere...
Embodiment 2
[0044] (1) Place the high-purity silica quartz glass vessel with the same workpiece shape in a heating furnace and heat it to 800 o C preheating and heat preservation;
[0045] (2) Melt high-purity aluminum in a high-purity aluminum oxide ceramic crucible, and add 3wt.% lanthanum to the aluminum liquid.
[0046] (3) Step (2) molten aluminum is heated to 800 o C is poured into step (1) in the high-purity silica quartz glass vessel, leaves standstill at 800 o C insulation;
[0047] (4) Control the holding time of step (3) for 2 hours to ensure that the aluminum liquid and silicon dioxide react, and the silicon atoms diffuse into the aluminum liquid, and finally cool with the furnace;
[0048] (5) Removing the residual quartz glass on the surface of the material in step (4) to obtain an in-situ self-generated aluminum-silicon gradient composite material consistent with the shape of the quartz glass vessel.
[0049] (6) See macro organization chart Figure 5 (The white spots ...
Embodiment 3
[0051] (1) Place the high-purity silica quartz glass vessel with the same workpiece shape in a heating furnace and heat it to 800 o C preheating and heat preservation;
[0052] (2) Melt high-purity aluminum in a high-purity aluminum oxide ceramic crucible, and add 1.00wt.% cerium to the aluminum liquid.
[0053] (3) Step (2) molten aluminum is heated to 800 o C is poured into step (1) in the high-purity silica quartz glass vessel, leaves standstill at 800 o C insulation;
[0054] (4) Control the holding time of step (3) for 2 hours to ensure that the aluminum liquid and silicon dioxide react, and the silicon atoms diffuse into the aluminum liquid, and finally cool with the furnace;
[0055] (5) Removing the residual quartz glass on the surface of the material in step (4) to obtain an in-situ self-generated aluminum-silicon gradient composite material consistent with the shape of the quartz glass vessel.
[0056] (6) See macro organization chart Figure 7 (The white spots ...
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