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Process method for extracting indium and tin from indium tin oxide (ITO) waste target

A process method and indium tin alloy technology are applied in the field of indium tin extraction from waste ITO targets by reduction and electrolysis, which can solve the problems of complex recovery process and high cost, and achieve the effects of simple operation, low production cost and high conversion rate.

Inactive Publication Date: 2019-07-02
ZHUZHOU SMELTER GRP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] In order to solve the defects of complex recovery process and high cost of existing ITO waste targets, the present invention provides a method for extracting indium and tin from ITO waste targets with simple method, low cost and high recovery rate of indium tin. Process method

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0070] Example 1, using 5 kg of ITO waste target as raw material, the composition of the raw material is: 90% by weight of indium oxide, and 10% by weight of tin oxide.

[0071] 1. Crushing and ball milling step S1

[0072] The raw material is crushed and ball milled to obtain more than 80% of the powder with a particle size below -120 mesh.

[0073] 2. Indium tin reduction step S2

[0074] Put the pulverized ITO waste target powder into the hydrogen reduction furnace, pass in hydrogen, then control the reduction temperature to 200°C, and the reduction reaction time to 60 minutes, and reduce indium oxide and tin oxide to metal indium and metal tin, indium and The recovery rate of tin is more than 99.5%.

[0075] 3. Anode casting step S3

[0076] Metal indium and tin are melted and cast under the cover of solid potassium hydroxide, soaked in 8% hydrochloric acid for 5 minutes, then washed with hot distilled water at 80°C for 2 minutes, and put on an acid-resistant bag to obt...

Embodiment 2

[0081] In Example 2, 5 kg of ITO waste target was used as a raw material, and the raw material was composed of 90% by weight of indium oxide and 10% by weight of tin oxide.

[0082] 1. Crushing and ball milling step S1

[0083] The raw material is crushed and ball milled to obtain more than 85% of the powder with a particle size below -120 mesh.

[0084] 2. Indium tin reduction step S2

[0085] Put the pulverized ITO waste target powder into the hydrogen reduction furnace, pass in hydrogen, then control the reduction temperature to 290°C, and the reduction reaction time is 50 minutes, and reduce indium oxide and tin oxide to metal indium and metal tin, indium and The recovery rate of tin is more than 99.5%.

[0086] 3. Anode casting step S3

[0087] Metal indium and tin are melted and cast under the cover of solid potassium hydroxide, soaked in 9% hydrochloric acid for 4 minutes, then washed with hot distilled water at 70°C for 3 minutes, and put on an acid-resistant bag to...

Embodiment 3

[0092] In Example 3, 5 kg of ITO waste target was used as a raw material, and the raw material was composed of 90% by weight of indium oxide and 10% by weight of tin oxide.

[0093] 1. Crushing and ball milling step S1

[0094] The raw material is crushed and ball milled to obtain more than 88% of the powder with a particle size below -120 mesh.

[0095] 2. Indium tin reduction step S2

[0096] Put the pulverized ITO waste target powder into the hydrogen reduction furnace, pass in hydrogen, then control the reduction temperature to 400°C, and the reduction reaction time is 30 minutes to reduce indium oxide and tin oxide to metal indium and metal tin, indium and The recovery rate of tin is more than 99.5%.

[0097] 3. Anode casting step S3

[0098] Metal indium and tin are melted and cast under the cover of solid sodium hydroxide, soaked in 12% hydrochloric acid for 3 minutes, then washed with hot distilled water at 50°C for 2 minutes, and put on an acid-resistant bag to obt...

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Abstract

The invention relates to a process method for extracting indium and tin from an indium tin oxide (ITO) waste target. The ITO waste target is crushed and ball-milled using a reducing substance, indiumoxide and tin oxide are reduced to the indium and the tin in a reduction furnace correspondingly, the indium and tin are cast into an indium-tin alloy anode under the protective effect of alkali, electrolysis is conducted under alkaline conditions, the tin is electro-deposited to a cathode and purity tin is recycled, anode slime is indium hydroxide, and the indium hydroxide is extracted through the processes of leaching, purification and electrodeposition. The process method for extracting the indium and the tin from the ITO waste target has the advantages of simple technological process, short recycling cycle and high indium and tin recovery rate, meanwhile, the problem of difficult filtration of tin hydroxide is solved, and thus the obvious advantages of low recycling cost, energy savingand environmental protection, and the like are achieved; and in industrial production, the recovery rate of the tin reaches 98.5%, the recovery rate of the indium is 99% or above, and the grade of purity indium and the purity tin exceeds 99.995%.

Description

technical field [0001] The invention belongs to the field of non-ferrous metal metallurgy, and in particular relates to a method for extracting indium tin through reduction and electrolysis of waste ITO targets. Background technique [0002] ITO (Tin-dopedIndiumOxide) target is an indium-tin composite oxide ceramic material. ITO film has the characteristics of light transmission, conductivity and heat reflection. It is widely used in transparent electrodes of flat-panel display devices, high-end building curtain walls, aircraft and vehicles. It is an important optoelectronic material for anti-frost and anti-fog glass, solar energy concentrating devices and lighting fixtures. In industrial applications, the utilization rate of ITO target sputtering coating is only 20% to 30%, and the remaining part becomes waste target material, plus the scrap, cutting and waste products generated during the target forming process. At present, the global ITO target consumption exceeds 1,500 ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C22B7/00C22B58/00C22B25/06C22B25/02C25C1/14
CPCC22B7/001C22B25/02C22B25/06C22B58/00C25C1/14Y02P10/20
Inventor 王文军刘敏张天芳
Owner ZHUZHOU SMELTER GRP
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