Boron-doped diamond/graphite composite electrode as well as manufacturing method thereof and double-battery reactor
A boron-doped diamond, composite electrode technology, applied in the field of new functional thin film materials, can solve the problems of large difference in thermal expansion coefficient, damage to normal use of equipment, easy to contaminate the chamber, etc. The effect of improving the binding force of the membrane base
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[0031] Please refer to figure 2 , a method for preparing a boron-doped diamond / graphite composite electrode provided in an embodiment of the present invention, comprising the following steps:
[0032] Step 1: Take the graphite substrate 1, and after sandblasting the graphite substrate 1, deposit a silicon-carbon compound layer 2 on the surface of the graphite substrate 1 to obtain a graphite substrate 1 with a silicon-carbon compound layer 2 on the surface;
[0033]Step 2: Carry out a diamond planting operation on the graphite substrate 1 with a silicon carbide layer 2 on the surface, and then deposit a boron-doped diamond layer 3 on the surface of the silicon carbide layer 2 to obtain a boron-doped diamond / graphite composite electrode.
[0034] In the preparation method provided by the embodiment of the present invention, firstly, the surface of the electrode is roughened by sandblasting pretreatment, which further enhances the mechanical lock and effect between the graphite...
Embodiment 1
[0047] A preparation method of boron-doped diamond / graphite composite electrode, comprising the following steps:
[0048] Step 1: Take the graphite substrate, place the graphite substrate in a sandblasting machine for wet sandblasting. Among them, the sand particles are silicon carbide, the particle size of the sand particles is 50 μm, the pressure of the spray gun is 2 bar, and the sand is blasted until the surface is rough, and finally cleaned with deionized water and dried with nitrogen.
[0049] The silicon carbide layer is deposited on the surface of the sandblasted graphite substrate by magnetron sputtering. During the deposition process, the graphite substrate is firstly cleaned by glow cleaning and ion etching. Among them, the specific operation of the glow cleaning is as follows: argon gas with a flow rate of 300 sccm is introduced, the negative bias voltage of the graphite substrate is 500 V, the cleaning pressure is 1.0 Pa, and the cleaning time is 30 minutes. The ...
Embodiment 2
[0053] A preparation method of boron-doped diamond / graphite composite electrode, comprising the following steps:
[0054] Step 1: Take the graphite substrate, place the graphite substrate in a sandblasting machine for wet sandblasting. Wherein, the sand particles are aluminum oxide, the particle size of the sand particles is 100 μm, the pressure of the spray gun is 4 bar, and the sand is blasted until the surface is rough, and finally cleaned with deionized water and dried with nitrogen.
[0055] The silicon carbide layer is deposited on the surface of the sandblasted graphite substrate by magnetron sputtering. During the deposition process, the graphite substrate is firstly cleaned by glow cleaning and ion etching. Among them, the specific operation of glow cleaning is: argon gas with a flow rate of 500 sccm is introduced, the negative bias voltage of the graphite substrate is 800 V, the cleaning pressure is 1.7 Pa, and the cleaning time is 10 minutes. The specific operation...
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