A press filter membrane for separating furfural with high temperature resistance, preparation method and application thereof
A technology of high temperature resistance and furfural, applied in the field of membrane separation, can solve the problems of limited membrane separation method, high cost, low separation efficiency, etc., and achieve long service life, excellent acid and alkali corrosion resistance, high membrane flux amount of effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0035] The press filter membrane for separating furfural with high temperature resistance provided by this application, in terms of mass percentage, its preparation raw material composition is as follows:
[0036] Film-forming material 35 wt%, said film-forming material is: polyvinylidene fluoride 30wt%, polyarylene sulfide ketamide 5wt%;
[0037] Solvent 25 wt%, said solvent is: dimethylacetamide 10 wt%, N-methylpyrrolidone 10 wt%, sulfolane 5wt%;
[0038] Film-forming additive 6wt%, described film-forming additive is: ether 1 wt%, polyethylene glycol 2 wt%, polyethylene 1 wt%, propylene glycol 2 wt%;
[0039] Dispersant 2wt%, described dispersant is tannic acid;
[0040] Plasticizer 3 wt%, described plasticizer is: dibutyl phthalate 1 wt%, diisodecyl phthalate 2wt%;
[0041] Defoamer 1 wt%, said defoamer is organic silicon;
[0042] Dehydrating agent 1 wt%, said dehydrating agent is xylene;
[0043] High temperature resistant protective agent 10 wt%, described high tempe...
Embodiment 2
[0056] The press filter membrane for separating furfural with high temperature resistance provided in this embodiment, in terms of mass percentage, its preparation raw material composition is as follows:
[0057] Film-forming material 32 wt%, said film-forming material is: polyvinylidene fluoride 12wt%, polyarylene sulfide ketoneamide 10wt%, polyether-b-polyamide 10%;
[0058] Solvent 20wt%, described solvent is: dimethylformamide 10wt%, dimethylacetamide 10wt%;
[0059] Film-forming additive 7wt%, described film-forming additive is: ether 2 wt%, polyethylene glycol 2 wt%, ethylene glycol 3 wt%;
[0060] Dispersant 3wt%, and described dispersant is carboxymethyl cellulose;
[0061] Plasticizer 2wt%, described plasticizer is: diisodecyl phthalate;
[0062] Defoamer 2wt%, described defoamer is organosiloxane;
[0063] Dehydrating agent 1 wt%, said dehydrating agent is xylene;
[0064] High temperature resistant protective agent 12 wt%, described high temperature resistant pr...
Embodiment 3
[0073] The press filter membrane for separating furfural with high temperature resistance provided in this embodiment, in terms of mass percentage, its preparation raw material composition is as follows:
[0074] Film-forming material 32 wt%, said film-forming material is: polyacrylonitrile 12wt%, polyarylene sulfide ketone amide 10wt%, polyether-b-polyamide 10%;
[0075] Solvent 13wt%, said solvent is: dimethylacetamide 8wt%, N-methylpyrrolidone 5wt%;
[0076] Film-forming additive 7wt%, described film-forming additive is: ethylene glycol 1 wt%, ether 1 wt%, polyethylene glycol 1wt%, polypropylene 2 wt%, propylene glycol 2 wt%;
[0077] Dispersant 3wt%, described dispersant is: carboxymethyl cellulose 2 wt%, tannic acid 1 wt%;
[0078] Plasticizer 2wt%, described plasticizer is: dibutyl phthalate;
[0079] Defoamer 2wt%, described defoamer is: organosilicon 1 wt%, organosiloxane 1 wt%;
[0080] Dehydrating agent 2wt%, described dehydrating agent is: xylene 1 wt%, chloroben...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com