Machining method for polishing process of RB-SiC optical element

Abstract

The invention discloses a machining method for the polishing process of an RB-SiC optical element. The machining method for the polishing process of the RB-SiC optical element comprises the steps that fine-grinding polishing of the RB-SiC optical element is achieved through the inductive coupling plasma polishing technique firstly, then a planarized nano-layer is deposited on the optical surface through the radio frequency magnetron sputtering surface planarization technique, and finally ultra-smooth surface machining of the optical element is achieved through the ion beam polishing shape-correction technique with the assistance of the free-radical microwave plasma polishing technique. Compared with the prior art, the plasma polishing technique is adopted by the novel machining method for polishing the RB-SiC optical element to replace a traditional optical machining method, the preparation technique of the planarized nano-layer and the ion beam shape-correction polishing technique are combined, the machining cycle of the large-diameter RB-SiC optical element is greatly shortened, and machining method for the polishing process of the RB-SiC optical element has the characteristics of high efficiency, high precision and low loss.

Description

technical field [0001] The present invention relates to the technical field of ultra-smooth precision machining on the surface of optical elements, in particular to a polishing process method for RB-SiC optical elements. Background technique [0002] In recent years, with the vigorous development of the aerospace industry and the rapid progress of social production, human beings have become more and more enthusiastic about exploring the space field. Aerospace technology has made significant contributions to human observation of space, research on the earth and the entire vast space. Many countries have begun to attach importance to the research of aerospace technology and space optics. In order to meet the requirements of use, large-scale space systems such as space telescopes and remote sensing reconnaissance cameras need to have a high enough resolution and a large enough aperture, but the increase of the aperture, the corresponding It will increase the weight of the entir...

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Problems solved by technology

[0011] The existing traditional optical processing methods have the following problems. First, the processing efficiency is low and the cycle time is long. Second, it is difficult to achieve an ultra-smooth surface (roughness RMS less than 1nm, surface shape RMS below λ / 5)

This is because: the deposition rate of magnetron sputtering is not high, and the deposition of tens of microns thick Si layer results in longer processing time. Second, magnetron sputtering deposits Si thin films. The roughness will deteriorate, usually from 7~8nm to more than ten nanometers

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