Graphene field-effect transistor and formation method thereof
A field effect transistor and graphene technology, which is applied in semiconductor devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problems of affecting the electrical performance of the device, and achieve easy control of the preparation process, simplification of the preparation process, and high current carrying capacity. The effect of sub-mobility
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[0028] The present invention provides a graphene field effect transistor and its forming method, which will be described in detail below in conjunction with the accompanying drawings.
[0029] Figure 1 to Figure 9 It is a cross-sectional schematic diagram of an intermediate structure of a method for forming a graphene field effect transistor according to an embodiment of the present invention.
[0030] refer to figure 1 , providing a substrate 100, the substrate 100 includes a first region 100a, a second region 100b, and a third region 100c between the first region 100a and the second region 100b; the substrate 100 includes a substrate 101 and a liner 102 , the lining layer 102 is formed on the substrate 101 ; and the graphite material layer 110 is formed on the substrate 100 .
[0031] In the embodiment of the present invention, the substrate 101 may be a silicon substrate, a silicon germanium substrate, a silicon carbide substrate, a silicon-on-insulator substrate, a germ...
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