Cleaning method for texturing of poly-silicon wafer
A technology of polycrystalline silicon wafers and silicon wafers, applied in semiconductor/solid-state device manufacturing, photovoltaic power generation, electrical components, etc., can solve the problems of reducing reflectivity, large suede surface, increasing light absorption, etc., to achieve improved electrical performance and low reflectivity Effect
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[0026] Objects, advantages and features of the present invention will be illustrated and explained by the following non-limiting description of preferred embodiments. These embodiments are only typical examples of applying the technical solutions of the present invention, and all technical solutions formed by adopting equivalent replacements or equivalent transformations fall within the protection scope of the present invention.
[0027] Silicon wafer texturing is a very important step in the processing of silicon solar cells. Texturing can not only form a textured surface with good light trapping properties, but also remove the damaged layer on the surface of the silicon wafer to form a textured surface that is good for the smoothness of the PN junction.
[0028] Such as figure 1 As shown, the present invention provides a kind of cleaning method of polycrystalline silicon chip texturing, the silicon chip after making texturing is cleaned, and this method comprises the followi...
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