Imprinting material

一种基材、质量份的技术，应用在薄料处理、仪器、电气元件等方向，能够解决低脱模力、低塑性变形性等问题，达到低脱模力性、低塑性变形性、放大工艺裕量的效果

Active Publication Date: 2017-04-19
NISSAN CHEM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, although various materials have been disclosed as imprint materials so far, there is no heat resistance that has low mold release force, low plastic deformation, no sublimation of decomposition products at temperatures exceeding 200°C, for example, 265°C, and Crack Resistance Material Report

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0105] Hereinafter, although an Example and a comparative example are given and this invention is demonstrated in more detail, this invention is not limited to these Examples.

[0106] The weight-average molecular weights of the silsesquioxane compounds obtained from Synthesis Example 1 and Synthesis Example 2 and the weight-average molecular weights of X-22-1602 and X-22-164, which are organosilicon compounds, obtained by gel permeation Chromatography (hereinafter, abbreviated as GPC in this specification) is the measurement result obtained. For the measurement, a GPC system manufactured by Tosoh Technology Co., Ltd. was used. The configuration and measurement conditions of this GPC system are as follows.

[0107] GPC main body: HLC-8320GPC

[0108] GPC column: Shodex (registered trademark) LF-804

[0109] Column temperature: 40°C

[0110] Solvent: THF

[0111] Flow rate: 1mL / min

[0112] Standard sample: 6 kinds of polystyrene with different weight average molecular we...

Synthetic example 1

[0114] In a 2000mL four-neck flask, add 486.98g of 3-acryloyloxypropyltrimethoxysilane and 400.53g of methanol, cool to 10°C while stirring, and add 0.1N hydrochloric acid dropwise at 10°C to 25°C for 30 minutes A mixed solution of 112.23 g of aqueous solution and 200.26 g of methanol. Then, it stirred at room temperature for 1 hour, stirred under reflux for 3 hours, concentrated under reduced pressure, and obtained 287.21 g of silsesquioxane compounds (PS-1). When the weight average molecular weight of the silsesquioxane compound obtained in this synthesis example 1 was measured by GPC, it was 1500. The silsesquioxane compound has a repeating unit represented by the above formula (4), in which Y represents an acryloyloxy group, R 5 represents methylene, and k represents 3.

Synthetic example 2

[0116] In a 2000mL four-necked flask, add 234.32g of 3-acryloyloxypropyltrimethoxysilane, 136.22g of methyltrimethoxysilane and 400.53g of methanol, and cool to 10°C under stirring. °C A mixed solution of 112.23 g of 0.1N hydrochloric acid aqueous solution and 200.26 g of methanol was added dropwise over 30 minutes. Then, it stirred at room temperature for 1 hour, stirred under reflux for 3 hours, concentrated under reduced pressure, and obtained 178.5 g of silsesquioxane compounds (PS-2). When the weight average molecular weight of the silsesquioxane compound obtained in this synthesis example 2 was measured by GPC, it was 2100. The silsesquioxane compound has a repeating unit represented by the above formula (4), in which Y represents an acryloyloxy group, R 5 represents methylene, and k represents 3.

[0117] [Preparation of imprint material]

[0118]

[0119]3.5 g of butyl acrylate (manufactured by Tokyo Chemical Industry Co., Ltd.) (hereinafter referred to simply as ...

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Abstract

To provide a novel imprinting material and a film manufactured from said material and having a pattern transferred thereon. An imprinting material contains components (A), (B), (C), and (D) below. Component A is a compound represented by formula (1), (2), or (3) (wherein X is a 1-5 carbon atom straight-chain alkylene group, R1 is a hydrogen atom or methyl group, R2, R3, and R4 are each independently a hydrogen atom, methyl group, or ethyl group, and the sum of the number of carbon atoms in R2, R3, and R4 is 0-2.) Component B is a silsesquioxane compound having a repeating unit represented by formula (4) and having two or more polymerizable groups represented by Y in the formula. Component C is a silicone compound having a repeating unit represented by formula (5) and having two polymerizable groups at the terminal end thereof (wherein R6 and R7 are each independently a 1-3 carbon atom alkyl group, R5 is a 1-3 carbon atom alkylene group, and k is an integer of 0 to 3.) Component D is a photopolymerization initiator.

Description

technical field [0001] The present invention relates to an imprint material (film-forming composition for imprint) and a film produced from the material and onto which a pattern is transferred. More specifically, it relates to an imprint material capable of easily peeling the above-mentioned pattern-transferred film from a mold when releasing the mold after curing, and forming a cured film having heat resistance to a heating process at a temperature exceeding 200° C., and A film made from this material and onto which a pattern has been transferred. Background technique [0002] In 1995, a new technique called nanoimprint lithography was proposed by Professor Chou, now at Princeton University (Patent Document 1). In nanoimprint lithography, a mold having an arbitrary pattern is brought into contact with a base material on which a resin film is formed, the resin film is pressed, and heat or light is used as an external stimulus to form a target pattern on the cured resin film...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/027B29C59/02C08F2/44C08F2/50C08F290/00
CPCC08F2/44H01L21/027C08F2/48G03F7/027G03F7/038G03F7/0755G03F7/0757C08F290/148Y10T428/24802G03F7/0002C08F220/1806C08F220/1811C08F220/1808C08F220/1804C08F230/085C08F230/08C08F220/18C08F290/068
Inventor 小林淳平加藤拓首藤圭介铃木正睦
Owner NISSAN CHEM CORP
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