Superconducting nanowire single photon detector based on deep silicon etching process and its preparation method
A single-photon detector and superconducting nanowire technology, which is applied in the field of light detection, can solve the problems of absorption efficiency influence and low absorption efficiency, and achieve the effects of avoiding the influence of absorption efficiency, high absorption efficiency, and improving device detection efficiency
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Embodiment 1
[0063] see image 3 , the present embodiment provides a superconducting nanowire single photon detector based on a deep silicon etching process, including:
[0064] SOI substrate 21, said SOI substrate 21 sequentially includes a back substrate 211, a buried oxide layer 212 and a top layer of silicon 213 from bottom to top;
[0065] The first anti-reflection layer 22 is located on the surface of the top layer silicon 213;
[0066] The second anti-reflection layer 23 is located on the surface of the back substrate 211;
[0067] a deep groove 24, penetrating through the second anti-reflection layer 23, the back substrate 211 and the buried oxide layer 212;
[0068] The optical cavity structure 25 is located on the surface of the first anti-reflection layer 22;
[0069] Superconducting nanowires 26, located between the first anti-reflection layer 22 and the optical cavity structure 25;
[0070] The mirror 27 is located on the surface of the optical cavity structure 25 .
[00...
Embodiment 2
[0079] see Figure 4 to Figure 14 , the present embodiment also provides a method for preparing a superconducting nanowire single-photon detector based on a deep silicon etching process. The method for preparing a superconducting nanowire single-photon detector based on a deep silicon etching process includes:
[0080] S1: providing an SOI substrate 21, the SOI substrate 21 sequentially includes a back substrate 211, a buried oxide layer 212 and a top layer of silicon 213 from bottom to top;
[0081] S2: forming a first anti-reflection layer 22 on the surface of the top silicon layer 213, and forming a second anti-reflection layer 23 on the surface of the back substrate 211;
[0082] S3: forming a superconducting nanowire 26 and an optical cavity structure 25 on the surface of the first anti-reflection layer 22, and the optical cavity structure 25 covers the superconducting nanowire 26;
[0083] S4: forming a mirror 27 on the surface of the optical cavity structure 25;
[00...
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