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Superconducting nanowire single photon detector based on deep silicon etching process and its preparation method

A single-photon detector and superconducting nanowire technology, which is applied in the field of light detection, can solve the problems of absorption efficiency influence and low absorption efficiency, and achieve the effects of avoiding the influence of absorption efficiency, high absorption efficiency, and improving device detection efficiency

Active Publication Date: 2019-02-01
SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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  • Abstract
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  • Application Information

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Problems solved by technology

[0006] In view of the above-mentioned shortcomings of the prior art, the purpose of the present invention is to provide a superconducting nanowire single photon detector based on deep silicon etching process and its preparation method, which is used to solve the problem of superconducting nanowire single photon detection in the prior art. The absorption efficiency of the detector is low, in order to solve the long-distance focusing of the back light to the NbN nanowire, a special long-focus lens is required, and the influence of the substrate Fabry-Perot cavity on the absorption efficiency, etc.

Method used

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  • Superconducting nanowire single photon detector based on deep silicon etching process and its preparation method
  • Superconducting nanowire single photon detector based on deep silicon etching process and its preparation method
  • Superconducting nanowire single photon detector based on deep silicon etching process and its preparation method

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Embodiment 1

[0063] see image 3 , the present embodiment provides a superconducting nanowire single photon detector based on a deep silicon etching process, including:

[0064] SOI substrate 21, said SOI substrate 21 sequentially includes a back substrate 211, a buried oxide layer 212 and a top layer of silicon 213 from bottom to top;

[0065] The first anti-reflection layer 22 is located on the surface of the top layer silicon 213;

[0066] The second anti-reflection layer 23 is located on the surface of the back substrate 211;

[0067] a deep groove 24, penetrating through the second anti-reflection layer 23, the back substrate 211 and the buried oxide layer 212;

[0068] The optical cavity structure 25 is located on the surface of the first anti-reflection layer 22;

[0069] Superconducting nanowires 26, located between the first anti-reflection layer 22 and the optical cavity structure 25;

[0070] The mirror 27 is located on the surface of the optical cavity structure 25 .

[00...

Embodiment 2

[0079] see Figure 4 to Figure 14 , the present embodiment also provides a method for preparing a superconducting nanowire single-photon detector based on a deep silicon etching process. The method for preparing a superconducting nanowire single-photon detector based on a deep silicon etching process includes:

[0080] S1: providing an SOI substrate 21, the SOI substrate 21 sequentially includes a back substrate 211, a buried oxide layer 212 and a top layer of silicon 213 from bottom to top;

[0081] S2: forming a first anti-reflection layer 22 on the surface of the top silicon layer 213, and forming a second anti-reflection layer 23 on the surface of the back substrate 211;

[0082] S3: forming a superconducting nanowire 26 and an optical cavity structure 25 on the surface of the first anti-reflection layer 22, and the optical cavity structure 25 covers the superconducting nanowire 26;

[0083] S4: forming a mirror 27 on the surface of the optical cavity structure 25;

[00...

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Abstract

The invention provides a superconducting nanowire single-photon detector based on a deep silicon etching process and a preparation method, which includes: an SOI substrate, including a back substrate, a buried oxide layer and a top layer of silicon from bottom to top; a first anti-reflection layer, located on the surface of the top silicon; the second anti-reflective layer, located on the surface of the back substrate; the deep groove, which penetrates the second anti-reflective layer, the back substrate and the buried oxide layer; the optical cavity structure, located on the first anti-reflective layer the surface; the superconducting nanowire is located between the first anti-reflection layer and the optical cavity structure; the reflector is located on the surface of the optical cavity structure. By etching deep grooves on the substrate, the distance between the coupling fiber and the device is shortened, which avoids the use of long focusing lenses in traditional back-coupling structure superconducting nanowire single-photon detection devices and facilitates the alignment of the fiber MU head and the device. Coupling; avoids the problem of long-distance focusing in the optical cavity structure and the impact of the substrate Fabry-Perot cavity on the absorption efficiency, has higher absorption efficiency for the target wavelength, and improves the device detection efficiency.

Description

technical field [0001] The invention belongs to the technical field of light detection, and relates to a superconducting nanowire single-photon detector, in particular to a superconducting nanowire single-photon detector based on a deep silicon etching process and a preparation method thereof. Background technique [0002] Superconducting Nanowire Single Photon Detector (SNSPD) is a new type of single photon detection device developed in recent years, which can realize high-efficiency single photon detection from visible light to near infrared. Due to its advantages such as high quantum efficiency, low dark count, high detection rate, and low time jitter, SNSPD has been rapidly applied in applications such as quantum information technology, laser communication, satellite-to-earth ranging, bioluminescent detection, and depth imaging. [0003] SNSPD mainly uses low-temperature superconducting ultra-thin film materials, such as NbN, Nb, NbTiN, WSi, etc. The typical thickness i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L39/02H01L39/24G01J11/00H10N60/80H10N60/01
Inventor 尤立星李浩王镇
Owner SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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