A preparing method of a tree-form silicone rubber dielectric elastomer material
A dielectric elastomer and silicone rubber technology is applied in the field of preparation of tree-shaped silicone rubber dielectric elastomer materials, which can solve the problems of high driving voltage, high electrode resistance, poor electro-deformation performance, etc., and achieve high precision High, flexible and reliable product quality
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
example 1
[0018] First weigh 10g of methylphenyldichlorosilane into a three-neck flask equipped with a thermometer and a reflux device, then add 100mL of deionized water, and place it in a water bath, raise the temperature to 60°C, stir for 5min, and then add 15g of dichlorosilane Methyldichlorosilane, stirred and reacted for 3 hours, the reaction was completed, stood still for 10 minutes, separated, removed the water layer to obtain an organic layer, added 3 g of potassium hydroxide powder to the organic layer, raised the temperature to 80 ° C, stirred and reacted for 1 hour, and obtained a ring Shaped polymethylphenylsiloxane; Add 3g octamethylcyclotetrasiloxane and 5g tetramethyltetravinylcyclotetrasiloxane successively to the above-mentioned cyclopolymethylphenylsiloxane, and stir to react 5h, then add 2g of 3-aminopropyltriethoxysilane, stir the reaction for 7h, filter, the obtained filter residue is 3-aminopropyl silicone rubber; add 3-aminopropyl silicone rubber into the three-nec...
example 2
[0021]First weigh 13g of methylphenyldichlorosilane into a three-necked flask with a thermometer and a reflux device, then add 150mL of deionized water, and place it in a water bath, raise the temperature to 65°C, stir for 7 minutes, and then add 17g of dichlorosilane Methyldichlorosilane, stirred and reacted for 3.5h, after the reaction was completed, stood still for 15min, separated the liquid, removed the water layer to obtain an organic layer, added 4g of potassium hydroxide powder to the organic layer, raised the temperature to 85°C, and stirred for 1.5h. Obtain cyclic polymethylphenylsiloxane; Add 4g octamethylcyclotetrasiloxane, 7g tetramethyltetravinylcyclotetrasiloxane successively in above-mentioned cyclopolymethylphenylsiloxane, Stir the reaction for 5.5 hours, then add 2.5g of 3-aminopropyl triethoxysilane, stir the reaction for 7.5 hours, filter, and the obtained filter residue is 3-aminopropyl silicone rubber; add 3-aminopropyl silicone rubber to the three Add 15...
example 3
[0024] First weigh 15g of methylphenyldichlorosilane into a three-necked flask equipped with a thermometer and a reflux device, then add 200mL of deionized water, and place it in a water bath, raise the temperature to 70°C, stir for 10min, and then add 20g of dichlorosilane Methyldichlorosilane, stirred and reacted for 4 hours, the reaction was completed, stood still for 20 minutes, separated, removed the water layer to obtain an organic layer, added 5 g of potassium hydroxide powder to the organic layer, raised the temperature to 90 ° C, stirred and reacted for 2 hours, and obtained a ring Shaped polymethylphenylsiloxane; Add 5g octamethylcyclotetrasiloxane and 8g tetramethyltetravinylcyclotetrasiloxane successively to the above-mentioned cyclopolymethylphenylsiloxane, stir and react 6h, then add 3g of 3-aminopropyltriethoxysilane, stir and react for 8h, filter, the obtained filter residue is 3-aminopropyl silicone rubber; add 3-aminopropyl silicone rubber into the three-necke...
PUM
Property | Measurement | Unit |
---|---|---|
Elastic modulus | aaaaa | aaaaa |
Elastic modulus | aaaaa | aaaaa |
Elastic modulus | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com