A doped photovoltaic thin film material
A photovoltaic thin film and doping technology, applied in photovoltaic power generation, sustainable manufacturing/processing, electrical components, etc., can solve problems affecting the production structure, cost and price cycle of sustainable development of the industrial chain, and achieve increased conduction stability performance, improve connection tightness, and improve the effect of surface energy storage performance
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Embodiment 1
[0033] A doped photovoltaic thin film material, in which a carbon-doped silicon dioxide layer and a defect-free doped graphene layer are sequentially arranged on an n-type Si substrate to form a doped photovoltaic thin film material with photovoltaic and photoconductive effects.
[0034] The preparation method of the doped photovoltaic thin film material, its steps are as follows:
[0035] Step 1, configure silica electrophoretic fluid: mix nano-silica, dispersant and alcohol solution, and ultrasonically disperse to obtain electrophoretic fluid;
[0036] Step 2, silicon dioxide film deposition: deposit the electrophoretic solution on the n-type Si substrate to obtain a silicon dioxide film layer;
[0037] Step 3, carbon-doped silicon dioxide layer: coating a thin coating of activated carbon on the surface of the silicon dioxide film layer, and sintering at high temperature to obtain a mixed layer of silicon dioxide and silicon carbide;
Embodiment 2
[0053] A doped photovoltaic thin film material, in which a carbon-doped silicon dioxide layer and a defect-free doped graphene layer are sequentially arranged on an n-type Si substrate to form a doped photovoltaic thin film material with photovoltaic and photoconductive effects.
[0054] The preparation method of the doped photovoltaic thin film material, its steps are as follows:
[0055] Step 1, configure silica electrophoretic fluid: mix nano-silica, dispersant and alcohol solution, and ultrasonically disperse to obtain electrophoretic fluid;
[0056] Step 2, silicon dioxide film deposition: deposit the electrophoretic solution on the n-type Si substrate to obtain a silicon dioxide film layer;
[0057] Step 3, carbon-doped silicon dioxide layer: coating a thin coating of activated carbon on the surface of the silicon dioxide film layer, and sintering at high temperature to obtain a mixed layer of silicon dioxide and silicon carbide;
[0058] Step 4, graphene coating: Rotat...
Embodiment 3
[0073] A doped photovoltaic thin film material, in which a carbon-doped silicon dioxide layer and a defect-free doped graphene layer are sequentially arranged on an n-type Si substrate to form a doped photovoltaic thin film material with photovoltaic and photoconductive effects.
[0074] The preparation method of the doped photovoltaic thin film material, its steps are as follows:
[0075] Step 1, configure silica electrophoretic fluid: mix nano-silica, dispersant and alcohol solution, and ultrasonically disperse to obtain electrophoretic fluid;
[0076] Step 2, silicon dioxide film deposition: deposit the electrophoretic solution on the n-type Si substrate to obtain a silicon dioxide film layer;
[0077] Step 3, carbon-doped silicon dioxide layer: coating a thin coating of activated carbon on the surface of the silicon dioxide film layer, and sintering at high temperature to obtain a mixed layer of silicon dioxide and silicon carbide;
[0078] Step 4, graphene coating: Rotat...
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