SiC fiber-reinforced TiAl-based composite with Mo coating and preparation method of SiC fiber-reinforced TiAl-based composite
A fiber reinforced, composite material technology, applied in the field of magnetron sputtering physical deposition, can solve the problems of hindering the interface reaction, the embrittlement of the matrix structure, the reduction of fiber strength, etc., to slow down the interface reaction, slow down the consumption rate, and excellent thermal stability. Effect
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Embodiment 1
[0033] (1) Firstly, a direct current electric heating chemical vapor deposition (CVD) device is used to prepare such as figure 2 Pyrolytic C coating 1 shown with a thickness of 2 μm;
[0034] (2) Wrap the C-coated SiC fiber on the rotating cage used for sputtering in the sputtering instrument, and ensure that there is no overlap between the fibers during the winding process. After winding the fiber, put the tumbler into the JGP-560A high-vacuum rectangular target magnetron sputtering apparatus to prepare the Mo coating. The sputtering process parameter is 875W / 0.63Pa / 40min, and the preparation effect is as follows: figure 2 , and the thickness of Mo coating 2 is 1.3 μm. After sputtering, take out the fiber, cut it into 100mm long pieces and store it in vacuum for use;
[0035] (3) Ti whose nominal composition is Ti-21Al-29Nb (at%) 2 AlNb-based alloys were machined with 5 pieces of foil with a length of 50 mm, a width of 10 mm, and a thickness of 300 μm by wire electric disc...
Embodiment 2
[0040] (1) Firstly, a direct current electric heating chemical vapor deposition (CVD) device is used to prepare such as figure 2 Pyrolytic C coating 1 shown with a thickness of 2 μm;
[0041] (2) Wrap the C-coated SiC fiber on the rotating cage used for sputtering in the sputtering instrument, and ensure that there is no overlap between the fibers during the winding process. After winding the fiber, put the tumbler into the JGP-560A high-vacuum rectangular target magnetron sputtering apparatus to prepare the Mo coating. The sputtering process parameter is 875W / 0.63Pa / 40min, and the preparation effect is as follows: figure 2 As shown, and the thickness of Mo coating 2 is 1.3 μm. After sputtering, take out the fiber, cut it into 100mm long pieces and store it in vacuum for use;
[0042] (3) After the sputtering of the Mo coating is completed, take out the Mo metal target, replace the γ-TiAl alloy target with a nominal composition of Ti-43Al-9V (at%), and continue to deposit ...
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