A preparation method for maintaining superhard properties and improving toughness for ultra-thick tin film layers

Abstract

The invention discloses a method for preparing a super-thick and high-toughness TiN film. The method for preparing the TiN film comprises the steps that 1, a metal filtered cathodic vacuum arc (FCVA) deposition system is adopted, and the surface of a workpiece is cleaned through high-energy large-beam metal ion beams; 2, a layer of metal 'pinning layer' capable of improving the film base binding force is injected into the surface of the workpiece through a metal vapor vacuum arc (MEVVA) ion source method; 3, on the metal 'pinning layer', the gas inlet quantity is subjected to sine or cosine modulation and deposition through a filtered cathodic vacuum arc (FCVA) deposition method, and thus the super-hard good-toughness thick TiN film layer is obtained; and 4, the modulation period is repeated till the total thickness of the TiN film is 10-30 microns. By means of the method for preparing the super-thick and high-toughness TiN film, the TiN film deposited on the workpiece has very good toughness and very high microhardness.

Description

technical field [0001] The invention relates to the technical field of surface modification of ray beam materials, in particular to a method for depositing an ultra-thick and ultra-tough TiN film on the surface of a workpiece under special working conditions. Background technique [0002] As an excellent coating material with high hardness, corrosion resistance and wide application, TiN has become a hot spot in the research of hard coatings at home and abroad. Recently, TiN has gradually started to be used in machinery industry, light industry, medical industry, decorations, microelectronics and optics. [0003] In the machinery industry, TiN is an ideal coating material for low-speed cutting tools, which can reduce the adhesion of cutting edge materials, reduce cutting force, increase the feed rate, improve machining accuracy, maintain the geometric stability of cutting, and improve the surface of the workpiece. . In addition, TiN is also an ideal coating for wear-resista...

AI Technical Summary

Problems solved by technology

[0008] Traditional TiN film preparation methods include electron beam evaporation, sputtering coating, arc ion plating, plasma immersion ion implantation technology, ordinary chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), laser chemical Vapor phase deposition (LCVD) and other methods, if the traditional process conditions are used, due to the limitation of the internal stress of the film and the bonding force of the film base, it is difficult to deposit a thick film (10-30um), which affects the industrial application of the TiN film.

Images