Device and method for detecting height and inclination of silicon wafer surface
A technology of silicon wafer surface and detection device, applied in the field of photolithography machine, can solve the problems of uneven reflectivity of silicon wafer, difficult use, complicated optical path design, etc., so as to eliminate the influence of the underlying pattern of the silicon wafer and improve the utilization of energy. rate, the effect of increasing the applicability of the process
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[0028] Below in conjunction with accompanying drawing, invention is described in detail:
[0029] Such as figure 1 As shown, the present invention provides a silicon wafer surface height and inclination detection device, which includes a light source 1, a collimator beam expander 2, a slit array 4, an angle adjustment unit 5, and a detector 8 arranged in sequence from the detection light path And signal processing unit 9, also includes polarization modulation unit 3 and polychromatic light separation unit 7, described detector 8 is made up of several detection units 80;
[0030] Specifically, the light source 1 provides an illuminating beam 101, and the illuminating beam 101 sequentially passes through the collimating beam expander 2 used to shape and homogenize the beam to generate a parallel beam, and is used to adjust the polarization direction of the illuminating beam 101. The polarization adjustment unit 3, the slit array 4 for converting the polarized beam 102 into the ...
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