Transparent laminated film, transparent conductive film, and gas barrier laminated film

A transparent conductive film and transparent conductive layer technology, applied to the conductive layer on the insulating carrier, electrical components, non-metallic conductors, etc., can solve the problems of surface resistance, poor durability and acid resistance, etc., to improve crystallinity, reduce Effect of surface resistance value

Active Publication Date: 2017-03-22
MITSUBISHI CHEM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, a film in which a transparent conductive film is formed on a transparent resin film is significantly inferior in surface resistance, durability, acid resistance, etc., compared to a film in which a transparent conductive film such as an ITO film is formed on a glass substrate.

Method used

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  • Transparent laminated film, transparent conductive film, and gas barrier laminated film
  • Transparent laminated film, transparent conductive film, and gas barrier laminated film
  • Transparent laminated film, transparent conductive film, and gas barrier laminated film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0301] (Preparation of Photocurable Composition 1)

[0302] 22.1% by mass of a photocurable bifunctional acrylate monomer (tricyclodecane dimethanol diacrylate, molecular weight 304, manufactured by Shin-Nakamura Chemical Industry Co., Ltd., trade name "A-DCP"), silica microparticles (Co., Ltd. Admatechs Co., Ltd., trade name "YA010C-SM1", average particle diameter 10nm) 77.2% by mass, photopolymerization initiator A (manufactured by BASF, trade name "IRGACURE127") 0.6 mass%, photopolymerization initiator B (manufactured by BASF, commercial product Name "IRGACURE184") 0.1% by mass was uniformly diluted with a solvent (propylene glycol monomethyl ether) to obtain a curable composition 1 (coating A) for forming a crosslinked resin layer.

[0303] (Production of transparent laminated film 1)

[0304] On one side of a biaxially stretched polyethylene terephthalate film (manufactured by Mitsubishi Plastics Corporation, trade name "Diafoil") with a thickness of 50 μm using a die co...

Embodiment 2

[0310] (Production of transparent laminated film 2)

[0311] On one side of the transparent laminated film 1 produced in Example 1, 88% by mass of a polyester resin (PESRESIN A-215GE manufactured by Takamatsu Yushishishishishishishishi Co., Ltd.) containing 12% by mass of an oxazoline-based polymer (EPOCROS WS-700 manufactured by Nippon Shokubai Co., Ltd.) was uniformly diluted with water to obtain a transparent laminated film in which a primer layer was formed on one side of the crosslinked resin layer of the transparent laminated film 1 2.

[0312] (Fabrication of Transparent Conductive Film 2 Formed with Transparent Conductive Layer)

[0313]An ITO film was formed as a transparent conductive layer with a thickness of 30 nm on the undercoat layer surface of the transparent multilayer film 2 by a sputtering method in a 200° C. environment. When the surface resistance value of the conductive layer of the obtained transparent conductive film 2 was measured with Loresta EP (m...

Embodiment 3

[0315] (Production of transparent laminated film 3)

[0316] One side of the transparent laminated film 1 produced in Example 1 was coated with a hard coat paint (NK hard B500 manufactured by Shin Nakamura Chemical Industry Co., Ltd.) so that the thickness after drying became 3 μm, and it was further cured using an ultraviolet irradiation device. Thus, the transparent laminated film 3 in which the undercoat layer was formed on one side of the crosslinked resin layer of the transparent laminated film 1 was obtained.

[0317] (Fabrication of Transparent Conductive Film 3 Formed with Transparent Conductive Layer)

[0318] An ITO film was formed as a transparent conductive layer with a thickness of 30 nm on the undercoat surface of the transparent multilayer film 3 by a sputtering method in a 200° C. environment. When the surface resistance value of the conductive layer of the obtained transparent conductive film 3 was measured with Loresta EP (manufactured by Mitsubishi Chemical...

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Abstract

Provided is a new transparent conductive film having superior transparency and thermal dimensional stability at a high temperature (for example, 200°C), and having a low surface resistance value. Further provided is a new transparent stacked film and a new gas barrier stacked film that can be used as a base material film for the transparent conductive film and in other types of transparent substrates. Provided is a transparent conductive film in which a transparent conductive layer is formed directly or through an undercoat comprising a resin material onto one side or both sides of a cross-linked resin layer of a transparent stacked film having the cross-linked resin layer on at least one surface of a base material film, the transparent conductive film being firstly characterized in that the transparent stacked film has a thermal shrinkage in the vertical direction and in the horizontal direction when heated for 10 minutes at a temperature of 200°C of 1.5% or less, and secondly characterized in that the surface resistance value of the transparent conductive film is 150 &OHgr; / □ or less.

Description

technical field [0001] The present invention relates to a transparent laminated film that can be used as a substrate material for solar cells, organic solar cells, flexible displays, organic EL lighting, touch panels, etc., and further relates to a transparent conductive film having conductivity and a gas barrier layer. Gas barrier laminated film. Background technique [0002] Conventionally, glass materials have been used as substrate materials for various display elements such as organic EL, solar cells, and the like. However, glass materials not only have disadvantages such as easy breakage, heavy weight, and difficulty in thinning, but also are not sufficient materials for the thinning and weight reduction of displays and the flexibility of displays in recent years. Therefore, thin and lightweight transparent resin film-like substrates have been studied as alternative materials instead of glass. [0003] In such applications, when a film-like resin substrate is used, h...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01B5/14B32B27/00B32B27/30
CPCB32B27/08B32B27/30B32B2307/412B32B2307/734B32B2457/12H01B1/08H01L31/022466
Inventor 木下升平山本赖安天内英隆
Owner MITSUBISHI CHEM CORP
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