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Laser direct writing photolithographic system combined with single quantum dot locating function and method thereof

A laser direct writing, single quantum dot technology, which is used in microlithography exposure equipment, photolithographic process exposure devices, and light metering using electrical radiation detectors. Institutional Effects

Active Publication Date: 2015-06-03
INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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  • Laser direct writing photolithographic system combined with single quantum dot locating function and method thereof
  • Laser direct writing photolithographic system combined with single quantum dot locating function and method thereof

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Embodiment Construction

[0043] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0044] see figure 1 , the present invention provides a laser direct writing lithography system combined with single quantum dot positioning function, which includes:

[0045] The laser direct writing exposure optical path is used to locate the coordinates of the single quantum dots on the sample, and complete the laser direct writing lithography function according to the coordinates of the single quantum dots, and transfer the designed mask pattern to the photoresist;

[0046] Single-photon anti-bunching test optical path, use the microscope objective lens to locate whether there is light in the focused material area on the sample and whether the light-emitting point is a single photon;

[0047] A controller system is us...

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Abstract

The invention discloses a laser direct writing photolithographic system combined with a single quantum dot locating function. The laser direct writing photolithographic system can be directly switched to a direct writing photolithographic function to achieve good connection after locating the position of a single quantum dot in a sample; the laser direct writing photolithographic system combined with the single quantum dot locating function can be used for manufacturing a micro-nano structure directly after locating the quantum dot. The system can use a single photon detection system composed of a single photon detector and a single photon counting board at the detection end and can record the coordinates, thereby achieving the laser direct writing processing function and achieving pumping and detecting operations of the quantum dot, and besides, the laser direct writing processing function and the pumping and detecting function of the quantum dot can be organically combined.

Description

technical field [0001] The invention relates to the technical fields of laser direct writing, single quantum dot positioning, single photon HBT experiment and automatic control, in particular to a laser direct writing photolithography system and method combined with single quantum dot positioning function. Background technique [0002] Single photon sources are key devices in exciting research fields such as quantum communications. Compared with single photon source solutions such as epitaxial quantum dots and single molecules, single photon sources based on colloidal quantum dots have the ability to work at room temperature, high efficiency, There are many important advantages such as stability; however, there are also defects such as fluorescent flickering effects and difficult positioning during production. [0003] In the preparation of single-photon source devices using colloidal quantum dots as luminescent materials, a major difficulty encountered is the positioning of...

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Application Information

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IPC IPC(8): G03F7/20G01J1/42
Inventor 许兴胜高永浩黄昕楠黎星云
Owner INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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