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Conductive zirconia revolving target and preparation method thereof

A zirconia, rotating target technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of increasing production steps, difficult to meet flexible control, increasing target cost, etc., to achieve low cost , The production process is simple and convenient, and the conductivity is good.

Active Publication Date: 2015-03-25
江苏拓创新材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Based on the current technical conditions, the preparation methods of rotating targets mainly include: hot isostatic pressing, hot pressing sintering and casting. The above processes have their own advantages and disadvantages, but it is difficult to meet the flexible control of different sizes, especially hot pressing The method can only produce a single target with a length of less than 300mm, so it can only achieve a certain length requirement by multi-section and segmental Bonding on the liner, which increases the production steps and increases the cost of target production

Method used

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  • Conductive zirconia revolving target and preparation method thereof
  • Conductive zirconia revolving target and preparation method thereof
  • Conductive zirconia revolving target and preparation method thereof

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preparation example Construction

[0023] see figure 1 , a method for preparing a conductive zirconia rotating target provided by the present invention comprises the following process steps:

[0024] Preparation of zirconia spraying powder: After mechanically mixing zirconia powder with a mass percentage of 93-98%, a purity of not less than 99.95wt%, and a particle size of 1-5um with carbon powder with a mass percentage of 2-7%, the Sinter in a hydrogen atmosphere at 1500-1700°C for 6-10 hours, and then spray dry to obtain 100-400 mesh spray powder.

[0025] Spraying substrate treatment: use cleaning and mechanical grinding to remove surface oil stains and oxide layers, and then use sandblasting to make the surface of the substrate reach a certain roughness to increase the bonding strength between the substrate and the coating.

[0026] Spraying base layer: Spray a layer of nickel-clad aluminum (Ni / Al), nickel-chromium (Ni / Cr), nickel-chromium-aluminum (Ni / Cr / Al) or Nickel-chromium-aluminum-yttrium (Ni / Cr / Al / ...

Embodiment 1

[0033] A zirconia target material with a thickness of 4mm is sprayed on a stainless steel tube with an outer diameter of 133mm and a length of 3191mm.

[0034] After mechanically mixing zirconia powder with a mass percentage of 98 wt%, a purity of not less than 99.5 wt%, and a particle size of 1um and a mass percentage of carbon powder with a mass percentage of 2 wt%, it was sintered at 1500°C for 6 hours with hydrogen, and then the sintered The powder is spray-dried and granulated to obtain a zirconia spray powder of 100-225 mesh.

[0035] Use absolute ethanol to remove oil stains on the surface, and sandblast to make the surface of the substrate reach a certain roughness.

[0036] A 0.1mm nickel-chromium-aluminum-yttrium coating was sprayed by plasma spraying method, and the parameters are shown in Table 2.

[0037] Table 2 Plasma spraying nickel chromium aluminum yttrium primer parameters

[0038]

[0039]

[0040] The zirconia spraying powder is sprayed on the subs...

Embodiment 2

[0046] A zirconia target material with a thickness of 6 mm is sprayed on a stainless steel tube with an outer diameter of 165 mm and a length of 2791 mm.

[0047] After mechanically mixing zirconia powder with a mass percentage of 95 wt%, a purity of not less than 99.5 wt%, and a particle size of 3um and a mass percentage of carbon powder with a mass percentage of 5 wt%, it was sintered at 1600°C for 8 hours with hydrogen, and then the sintered The powder is spray-dried and granulated to obtain zirconia spray powder of 140-325 mesh.

[0048] Use absolute ethanol to remove oil stains on the surface, and sandblast to make the surface of the substrate reach a certain roughness.

[0049] The 0.3mm nickel-chromium coating was sprayed by plasma spraying method, and the parameters are shown in Table 4.

[0050] Table 4 Plasma Spraying Nickel-Chromium Primer Parameters

[0051]

[0052]

[0053] The zirconia spray powder is sprayed on the substrate tube that has been sprayed wit...

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Abstract

The invention provides a conductive zirconia revolving target. The conductive zirconia revolving target is composed of ZrOx and has a density of 5.18-5.8 g / cm3, wherein X is larger than or equal to 1.2 and smaller than or equal to 1.8. The invention also provides a preparation method of the conductive zirconia revolving target. The method comprises preparing zirconia spraying powder; processing a spray substrate; spraying a priming coat; spraying a zirconia coating onto the spray substrate through a plasma spraying process. The conductive zirconia revolving target is compact in structure, uniform in composition, high in electrical conductivity, crackless and free from restriction to spray length and diameter can reach a thickness of 13 mm and a density of 5.18-5.8 g / cm3. The preparation method of the conductive zirconia revolving target is simple and convenient in production process and relatively low in cost.

Description

technical field [0001] The invention relates to the technical field of material preparation, in particular to a conductive zirconia rotating target and a preparation method thereof. Background technique [0002] Magnetron sputtering is generally divided into two types: DC sputtering and radio frequency sputtering. Among them, DC sputtering can only sputter conductive materials, but its equipment principle is simple, and its speed is also fast when sputtering metals; while radio frequency sputtering The scope of use is wider. In addition to sputtering conductive materials, non-conductive materials can also be sputtered. At the same time, compound materials such as oxides, nitrides and carbides can also be prepared by reactive sputtering. Since the metal target needs to be oxidized to form an oxide film when the sputtering method is used to produce a high refractive index film, the process is relatively complicated and it is difficult to obtain a film with excellent performanc...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/08
CPCC23C14/083C23C14/3407C23C14/3414
Inventor 不公告发明人
Owner 江苏拓创新材料科技有限公司
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