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Oxalic acid-series ITO (Indium Tin Oxide) etching liquid, as well as preparation method and application thereof

A technology of etching solution and oxalic acid, which is applied in chemical instruments and methods, surface etching compositions, cable/conductor manufacturing, etc., can solve the problem of high risk for operators and client equipment, difficulty in controlling etching angle and etching time, etc. Solving problems such as complex liquid preparation process, achieving the effects of easy control, effective foaming suppression, high efficiency and etching

Active Publication Date: 2015-03-04
SHENZHEN CAPCHEM TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The disadvantage of the above etching solution is its strong corrosion ability. During the reagent etching process, it is often difficult to control the etching angle and etching time, and the danger to operators and client equipment is also high.
Moreover, the preparation process of the above etching solution is relatively complicated

Method used

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  • Oxalic acid-series ITO (Indium Tin Oxide) etching liquid, as well as preparation method and application thereof
  • Oxalic acid-series ITO (Indium Tin Oxide) etching liquid, as well as preparation method and application thereof
  • Oxalic acid-series ITO (Indium Tin Oxide) etching liquid, as well as preparation method and application thereof

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Embodiment Construction

[0020] The present invention will be further described in detail below through specific embodiments in combination with examples and test examples.

[0021] The oxalic acid-based ITO etching solution of the present invention uses oxalic acid as the main component. Compared with the etching solution in the form of hydrochloric acid / nitric acid mixed aqueous solution and hydrochloric acid / ferric chloride aqueous solution, the corrosion ability is low, and the etching conditions are mild. During the reagent etching process, It is easy to control the etching angle and etching time, so the etching precision is high. Additionally, there is less risk to operators and client devices.

[0022] In the oxalic acid series ITO etching solution of the present invention, the main function of the alkylphenol polyoxyethylene ether series surfactant is to reduce the surface tension of the ITO etching solution, produce the effect of penetration and infiltration, and improve the etching precision...

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Abstract

The invention discloses an oxalic acid-series ITO (Indium Tin Oxide) etching liquid, as well as a preparation method and application thereof. The oxalic acid-series ITO etching liquid comprises the following raw materials in percent by weight: 0.5 to 10 percent of oxalic acid, 0.1 to 0.5 percent of an alkyl phenol polyoxyethylene ether-series surfactant, 0.1 to 5 percent of organic polybasic phosphonic acid, and the balance of water. The oxalic acid-series ITO etching liquid can be used for etching an ITO layer under a mild condition, while residue and a great amount of foam cannot be generated after etching.

Description

technical field [0001] The invention relates to a composition for chemical etching of metal materials and a preparation process thereof, in particular to an oxalic acid-based ITO etchant and a preparation method and application thereof. Background technique [0002] Indium tin oxide (ITO) conductive film refers to a high-tech product obtained by sputtering a transparent ITO conductive film coating on a transparent organic film material by magnetron sputtering and then undergoing high-temperature annealing treatment. ITO conductive film is widely used in liquid crystal display (LCD), solar cell, microelectronic ITO conductive film glass, optoelectronics and various optical fields. [0003] Thin-film field-effect transistor liquid crystal display (TFT-LCD), light-emitting diode (LED), organic light-emitting diode (OLED) and other industries are used as panels in the process of etching indium tin oxide semiconductor transparent conductive film (ITO) usually using hydrochloric a...

Claims

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Application Information

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IPC IPC(8): C09K13/00H01B5/14H01B13/00
Inventor 康威
Owner SHENZHEN CAPCHEM TECH
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