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A kind of anti-ultraviolet radiation transparent high barrier film and its application

A high-barrier film, anti-ultraviolet technology, used in gaseous chemical plating, coating, layered products, etc., can solve problems affecting the appearance of packaging, and achieve the effect of preventing surface adsorption, thin coating, and high barrier properties

Active Publication Date: 2016-09-14
LUCKY HUAGUANG GRAPHICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The content of nitrogen in the film is 3-10%, and the transparent color of the film will have a golden color, which will affect the appearance of the package

Method used

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  • A kind of anti-ultraviolet radiation transparent high barrier film and its application
  • A kind of anti-ultraviolet radiation transparent high barrier film and its application
  • A kind of anti-ultraviolet radiation transparent high barrier film and its application

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 3

[0043] In embodiment 3, a=4, b1=11,

[0044] but

[0045] The nitrogen-doped titanium dioxide layer of the present invention can be formed in a known manner, preferably by vacuum coating equipment, such as chemical vapor deposition, sputtering, etc., more preferably by plasma chemical vapor deposition. The nitrogen-doped titanium dioxide layer of the present invention can be formed by plating one or more times. The total thickness of the nitrogen-doped titanium dioxide layer is 100-300 nm, preferably 150-200 nm. If the nitrogen-doped titanium dioxide layer is too thick, the coating is easy to become brittle , Membrane rupture occurs during use, which affects performance, and at the same time, causes high cost and is uneconomical; if the coating is too thin, the anti-ultraviolet effect is not good.

[0046] Nitrogen-doped titanium dioxide can red-shift the ultraviolet absorption peak, and can have strong absorption for ultraviolet rays below 400nm. At the same time, the nitro...

Embodiment 1

[0076] A 100nm-thick silicon oxide layer (2) was plated on a PET substrate (1) with a thickness of 12 μm and a light transmittance of 91% by plasma-enhanced chemical vapor deposition; the process parameters were:

[0077] Pulse power 30w Oxygen to Monomer Ratio o 2 :HMDSO 2:1 duty cycle 15% work pressure 10Pa

[0078] A 200nm-thick nitrogen-doped titanium oxide layer (3) with a nitrogen content of 1% is plated on the silicon oxide layer (2) by plasma-enhanced chemical vapor deposition (PECVD), and the process parameters are:

[0079] RF Power 30w Monomer to Nitrous Oxide Flow Ratio Ti (IPO 4 ) :N 2 o 8:1 Oxygen to monomer flow ratio o 2 :Ti(IPO 4 ) 4:1 work pressure 65Pa

[0080] The specific structure is as figure 1 shown.

Embodiment 2

[0082] The process parameters for plating a 120nm thick titanium oxide layer (4) on a PEN substrate (1) with a thickness of 12 μm and a light transmittance of 87% by plasma enhanced chemical vapor deposition are:

[0083] RF Power 20w Oxygen to monomer flow ratio o 2 :Ti(IPO 4 ) 3:1 work pressure 65Pa

[0084] A 100nm-thick aluminum oxide layer (2) is plated on the titanium oxide layer (4) by ion evaporation or sputtering, and a 150nm-thick nitrogen-doped nitrogen content of 1% is plated on the aluminum oxide layer (2). Titanium heterooxide layer (3), the process parameters are the same as those in Example 1. The specific structure is as figure 2 shown.

[0085] Example 3

[0086] A 50nm-thick first titanium oxide layer (4a) was plated on a PET substrate (1) with a thickness of 100 μm and a light transmittance of 89% by plasma-enhanced chemical vapor deposition (PECVD); on the first titanium oxide layer (4a ) layer is coated with silic...

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Abstract

A kind of anti-ultraviolet radiation transparent high-barrier film and its application, which includes a base material, after improvement, at least one layer of gas barrier layer formed by inorganic compound is plated on the base material, and at least one layer of gas barrier layer formed by inorganic compound is plated on the gas barrier layer formed by inorganic compound A nitrogen-doped titanium dioxide layer, wherein the nitrogen content in the nitrogen-doped titanium dioxide layer is 0.5-1%, and the total thickness of the nitrogen-doped titanium dioxide layer is 100-300nm. The present invention has an absorption rate of more than 99% for UVA and more than 99% for UVB, and can effectively prevent and protect the contents from ultraviolet rays; It is brittle and can maintain high barrier properties, and the transparency of the film is maintained at a transmittance of more than 80% for visible light, which meets the requirements of packaging visualization. It can be used in food and drug packaging, electronic device packaging and other fields.

Description

technical field [0001] The invention relates to a high-performance film, in particular to a transparent high-barrier film for preventing ultraviolet radiation and its application. Background technique [0002] Compared with multi-layer co-extruded barrier films, inorganic high barrier films have the advantages of high barrier property, resource saving, and environmental friendliness. It has been widely used in the packaging of fatty foods, sterilized and heated foods, soft drinks such as beverages, beer, and fruit juices, and for packaging electronic components. For example, the application number is 201220280872.4 Chinese patent uses silicon oxide film coated on one side or both sides of PET and then combined with PA and CPP to make a high-barrier and retort-resistant composite film. [0003] The transparent packaging film can visually observe the content, giving aesthetic and intuitive feeling, and the market application is constantly expanding. However, it cannot preven...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B32B27/06C23C16/40C23C16/30
Inventor 吴常良李丽黄尚鸿刘贤豪
Owner LUCKY HUAGUANG GRAPHICS
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