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Ultraviolet radiation-proof transparent high-barrier thin film and applications thereof

A high-barrier film and anti-ultraviolet technology, which is applied in the direction of gaseous chemical plating, coating, layered products, etc., can solve problems affecting the appearance of packaging, and achieve the effects of preventing surface adsorption, high barrier properties, and good flexibility

Active Publication Date: 2014-12-03
LUCKY HUAGUANG GRAPHICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The content of nitrogen in the film is 3-10%, and the transparent color of the film will have a golden color, which will affect the appearance of the package

Method used

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  • Ultraviolet radiation-proof transparent high-barrier thin film and applications thereof
  • Ultraviolet radiation-proof transparent high-barrier thin film and applications thereof
  • Ultraviolet radiation-proof transparent high-barrier thin film and applications thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 3

[0042] In embodiment 3, a=4, b1=11,

[0043] but

[0044] The nitrogen-doped titanium dioxide layer of the present invention can be formed in a known manner, preferably by vacuum coating equipment, such as chemical vapor deposition, sputtering, etc., more preferably by plasma chemical vapor deposition. The nitrogen-doped titanium dioxide layer of the present invention can be formed by plating one or more times. The total thickness of the nitrogen-doped titanium dioxide layer is 100-300 nm, preferably 150-200 nm. If the nitrogen-doped titanium dioxide layer is too thick, the coating is easy to become brittle , Membrane rupture occurs during use, which affects performance, and at the same time, causes high cost and is uneconomical; if the coating is too thin, the anti-ultraviolet effect is not good.

[0045] Nitrogen-doped titanium dioxide can red-shift the ultraviolet absorption peak, and can have strong absorption for ultraviolet rays below 400nm. At the same time, the nitro...

Embodiment 1

[0075] A 100nm-thick silicon oxide layer (2) was plated on a PET substrate (1) with a thickness of 12 μm and a light transmittance of 91% by plasma-enhanced chemical vapor deposition; the process parameters were:

[0076]

[0077] A 200nm-thick nitrogen-doped titanium oxide layer (3) with a nitrogen content of 1% is plated on the silicon oxide layer (2) by plasma-enhanced chemical vapor deposition (PECVD), and the process parameters are:

[0078]

[0079] The specific structure is as figure 1 shown.

Embodiment 2

[0081] RF Power 20w Oxygen to monomer flow ratio o 2 :Ti(IPO 4 ) 3:1 work pressure 65Pa

[0082] A 100nm-thick aluminum oxide layer (2) is plated on the titanium oxide layer (4) by ion evaporation or sputtering, and a 150nm-thick nitrogen-doped nitrogen content of 1% is plated on the aluminum oxide layer (2). Titanium heterooxide layer (3), the process parameters are the same as those in Example 1. The specific structure is as figure 2 shown.

[0083] Example 3

[0084] A 50nm-thick first titanium oxide layer (4a) was plated on a PET substrate (1) with a thickness of 100 μm and a light transmittance of 89% by plasma-enhanced chemical vapor deposition (PECVD); on the first titanium oxide layer (4a ) layer is coated with silicon oxynitride with a thickness of 100nm to form the first gas barrier layer (2a); a second titanium oxide layer (4b) with a thickness of 100nm is coated on the first gas barrier layer (2a); a second titanium oxide ...

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Abstract

The invention relates to an ultraviolet radiation-proof transparent high-barrier thin film and applications thereof. The ultraviolet radiation-proof transparent high-barrier thin film comprises a base material, after improvement, at least one gas barrier layer formed by an inorganic compound is plated on the base material, at least one nitrogen-doped titanium dioxide layer is plated on the gas barrier layer formed by the inorganic compound, the content of nitrogen in the nitrogen-doped titanium dioxide layer is 0.5-1%, and the total thickness of the nitrogen-doped titanium dioxide layer is 100-300nm. The absorptivity on UVA can reach more than 99%, the absorptivity on UVB can reach more than 99%, and contents can be effectively prevented and protected from being damaged by ultraviolet rays; the plating layers are thin, the thin film is good in flexibility, is non-friable during machining, and can keep high barrier property, and the transparency of the thin film can be kept reaching more than 80% of the transmittance of visible light so as to meet the requirement of packaging visualization. The ultraviolet radiation-proof transparent high-barrier thin film can be used in the fields of food and drug packaging, packaging of electronic devices, and the like.

Description

technical field [0001] The invention relates to a high-performance film, in particular to a transparent high-barrier film for preventing ultraviolet radiation and its application. Background technique [0002] Compared with multi-layer co-extruded barrier films, inorganic high barrier films have the advantages of high barrier property, resource saving, and environmental friendliness. It has been widely used in the packaging of fatty foods, sterilized and heated foods, soft drinks such as beverages, beer, and fruit juices, and for packaging electronic components. For example, the application number is 201220280872.4 Chinese patent uses silicon oxide film coated on one side or both sides of PET and then combined with PA and CPP to make a high-barrier and retort-resistant composite film. [0003] The transparent packaging film can visually observe the content, giving aesthetic and intuitive feeling, and the market application is constantly expanding. However, it cannot preven...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B32B27/06C23C16/40C23C16/30
Inventor 吴常良李丽黄尚鸿刘贤豪
Owner LUCKY HUAGUANG GRAPHICS
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