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OLED array substrate, manufacturing method thereof, display panel and display device

A technology of array substrates and substrates, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., and can solve the problems of multiple preparation processes of reflective layers and increased reflectivity

Active Publication Date: 2014-07-23
WUHAN TIANMA MICRO ELECTRONICS CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Embodiments of the present invention provide an OLED array substrate and its preparation method, a display panel, and a display device to solve the problems in the prior art that there are many preparation processes for the reflective layer and that the reflectivity needs to be improved

Method used

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  • OLED array substrate, manufacturing method thereof, display panel and display device
  • OLED array substrate, manufacturing method thereof, display panel and display device
  • OLED array substrate, manufacturing method thereof, display panel and display device

Examples

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Embodiment 1

[0021] Such as figure 2 As shown, it is an OLED array substrate provided in Embodiment 1 of the present invention. The OLED array substrate includes: a substrate 201, a TFT array 202 located on the substrate 201, a plurality of OLED pixel units 203, and any OLED pixel unit 203 includes:

[0022] The first electrode 2031, the second electrode 2032, and the light emitting structure layer 2033 between the first electrode 2031 and the second electrode 2032, wherein the first electrode 2031 is closer to the Substrate 201.

[0023] In the embodiment of the present invention, the first electrode 2031 is a film layer formed by doping a dopant substance and graphene at a set molar ratio, wherein the dopant substance is a simple metal substance.

[0024] Preferably, the metal element is any one of silver, titanium, vanadium, iron, aluminum, zinc, tin, copper, gold or platinum.

[0025] In the embodiment of the present invention, since the structure of the array substrate involved is...

Embodiment 2

[0032] combine image 3 As shown, the method for preparing the OLED array substrate provided in the second embodiment of the present invention specifically includes the following steps:

[0033] Step 301: Provide a substrate.

[0034] The substrate may be a rigid substrate or a flexible substrate, and the present invention does not specifically limit the material of the substrate.

[0035] Step 302: forming a TFT array on the substrate.

[0036]After step 301, a thin film transistor array substrate, ie a TFT array, is formed on the substrate. Wherein, the TFT array includes: an active layer, a gate, a gate insulating layer, a source, a drain, a passivation layer and other structures, and the above structure is based on the film structure technology in the prior art (deposition, photolithography, etc.) process) are sequentially formed, and may be a top-gate structure or a bottom-gate structure.

[0037] Step 303: forming a plurality of OLED pixel units on the TFT array. Sp...

Embodiment 3

[0047] Based on the OLED array substrate provided by the embodiment of the present invention, Embodiment 3 of the present invention also proposes a display panel. The display panel includes the OLED array substrate described in Embodiment 1, and also includes a packaging cover plate and the like that are arranged opposite to the OLED array substrate in the prior art.

[0048] In addition, an embodiment of the present invention also provides a display device, including the display panel described in Embodiment 3 and other display device units in the prior art, such as a driving module, a polarizer, and the like.

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Abstract

The invention discloses an OLED array substrate, a manufacturing method of the OLED array substrate, a display panel and a display device. According to the main content of the manufacturing method, the technological process that a deposition technology is utilized three times to sequentially form an ITO layer, a metal layer and an ITO layer is avoided, and just by performing the deposition technology once, a first electrode with the reflection function and the functions of an anode can be formed with single metals and graphene doped according to a set mole ratio. While the technological process is reduced, oxidization and sulfifation of the single metals are avoided; moreover, single metal atoms in the first electrode are evenly distributed in the graphene structure, and thus the light reflectivity can be further improved effectively.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an OLED array substrate and a preparation method thereof, a display panel and a display device. Background technique [0002] In organic light-emitting (OLED, Organic Light-Emitting Diode) display technology, such as figure 1 Shown is the reflective layer structure in the traditional top emission structure. Depend on figure 1 It can be seen that the reflective layer includes a first ITO layer 101, a metal layer 102, and a second ITO layer 103 from top to bottom. The material used for the first ITO layer 101 is indium tin oxide (ITO, Indium Tin Oxides), and the metal The material used for the layer 102 is metallic silver (Ag), the material used for the second ITO layer 103 is indium tin oxide (ITO, Indium Tin Oxides), and the three-layer film structure together serves as a reflective layer. Among them, the first ITO layer 101 on the uppermost layer has a thickness of 100-250A,...

Claims

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Application Information

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IPC IPC(8): H01L27/32H01L51/56
Inventor 刘海蒋卡恩姚红莉刘刚姚宇环
Owner WUHAN TIANMA MICRO ELECTRONICS CO LTD
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