Preparation method for shape-controllable silver nanosheet assembly structure array and application of shape-controllable silver nanosheet assembly structure array

A technology of silver nanosheets and assembled structures, which is applied in nanotechnology, nanotechnology, nanotechnology, etc. for materials and surface science, and can solve problems such as restricting use occasions and application fields, increasing complexity and cost, and single product , to achieve the effects of expanding use occasions and application fields, enriching optical properties, and scientific preparation methods

Inactive Publication Date: 2014-05-28
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, both the hollow sphere micro / nano structure array based on silver nanosheets and its preparation method have shortcomings. First, the product is only a micro-nano structure array with a single shape, which restricts its development. Use occasions and application fields; secondly, in addition to using an external power source for electrodeposition, the preparation method also needs to use dichloromethane solution to dissolve polystyrene colloidal balls, which not only increases the complexity and cost of preparation, but also is easy to cause damage to the environment. create pollution

Method used

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  • Preparation method for shape-controllable silver nanosheet assembly structure array and application of shape-controllable silver nanosheet assembly structure array
  • Preparation method for shape-controllable silver nanosheet assembly structure array and application of shape-controllable silver nanosheet assembly structure array
  • Preparation method for shape-controllable silver nanosheet assembly structure array and application of shape-controllable silver nanosheet assembly structure array

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Effect test

Embodiment 1

[0028] The specific steps of preparation are:

[0029] Step 1, first place the inert conductive substrate in a vacuum evaporation apparatus, at a current density of 8mA / cm 2 The gold is evaporated for 24 s to obtain an inert conductive substrate covered with a gold film; wherein, the inert conductive substrate is a conductive glass substrate. Then, a positive photoresist with a thickness of 1 μm was coated on the inert conductive substrate covered with gold film, and it was dried at 90 °C for 20 min to obtain an inert conductive substrate covered with positive photoresist and gold film in turn. ; Among them, the coating is spin coating, the rotation speed during spin coating is 4000r / min, and the time is 20s.

[0030] Step 2, cover the photolithography plate with an ordered array of light-transmitting patterns on the inert conductive substrate sequentially covered with positive photoresist and gold film, and then expose it to ultraviolet light for 36 s; The light transmissio...

Embodiment 2

[0033] The specific steps of preparation are:

[0034] Step 1, first place the inert conductive substrate in a vacuum evaporation apparatus, at a current density of 9mA / cm 2 The gold is evaporated for 23 s to obtain an inert conductive substrate covered with a gold film; wherein, the inert conductive substrate is a conductive glass substrate. Then, a positive photoresist with a thickness of 1.1 μm was coated on the inert conductive substrate covered with the gold film, and it was dried at 93 °C for 19 min to obtain an inert conductive substrate covered with positive photoresist and gold film in sequence. The substrate; wherein, the coating is spin coating, the rotational speed during spin coating is 4000r / min, and the time is 20s.

[0035] Step 2, firstly cover the photolithography plate with an ordered array of light-transmitting patterns on the inert conductive substrate covered with positive photoresist and gold film in sequence, and then expose it to ultraviolet light for...

Embodiment 3

[0038] The specific steps of preparation are:

[0039] Step 1, first place the inert conductive substrate in a vacuum evaporation apparatus, at a current density of 10mA / cm 2 The gold is evaporated for 22 s to obtain an inert conductive substrate covered with a gold film; wherein, the inert conductive substrate is a conductive glass substrate. Then, a positive photoresist with a thickness of 1.2 μm was coated on the inert conductive substrate covered with gold film, and it was dried at 95 °C for 17 min to obtain an inert conductive substrate covered with positive photoresist and gold film in sequence. The substrate; wherein, the coating is spin coating, the rotational speed during spin coating is 4000r / min, and the time is 20s.

[0040] Step 2, firstly cover the photolithography plate with an ordered array of light-transmitting patterns on the inert conductive substrate covered with positive photoresist and gold film in sequence, and then expose it to ultraviolet light for 38...

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Abstract

The invention discloses a preparation method for a shape-controllable silver nanosheet assembly structure array and application of the shape-controllable silver nanosheet assembly structure array. The method comprises the following steps: performing gold steaming on an inert conductive substrate, coating the inert conductive substrate with positive photoresist, and drying the positive photoresist to obtain an inert conductive substrate coated with the positive photoresist and a gold film; covering the inert conductive substrate coated with the positive photoresist and the gold film by using a photoetching plate with an ordered array transmitting pattern, exposing the inert conductive substrate under ultraviolet light, rinsing the inert conductive substrate in a developing solution, and drying the inert conductive substrate to obtain an inert conductive substrate with the ordered array transmitting pattern, the positive photoresist and the gold film; connecting the inert conductive substrate serving as a positive electrode with a copper sheet serving as a negative electrode by using a wire, placing the inert conductive substrate and the copper sheet in silver electrolyte, and standing to obtain the shape-controllable silver nanosheet assembly structure array. The shape-controllable silver nanosheet assembly structure array can be widely used as an active substrate for surface enhanced raman scattering, and a laser raman spectrometer is used for measuring a trace amount of rhodamine or tetrachlorobiphenyl attached to the shape-controllable silver nanosheet assembly structure array.

Description

technical field [0001] The invention relates to a preparation method of a structure array and the use of the product thereof, in particular to a preparation method of a silver nanosheet assembly structure array with controllable morphology and the use of the product thereof. Background technique [0002] Silver nanomaterials have unique optical properties and excellent electrical conductivity, which can be widely used in biological detection, environmental detection based on surface-enhanced Raman scattering (SERS) effect, and nanoelectronic devices. In the field of SERS applications and nanoelectronic devices, how to construct large-scale ordered nanostructure arrays is one of the key issues. At present, people have made unremitting efforts to obtain large-scale ordered nanostructure arrays. "A hollow sphere micro / nanostructure array with silver nanosheets as the basic element and its preparation method". The micro / nano-structure array mentioned in this application docume...

Claims

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Application Information

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IPC IPC(8): C25D3/46C23C14/24C23C14/04B82Y30/00B82Y40/00G01N21/65
Inventor 李中波孟国文赵志飞梁婷
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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