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A kind of high-speed selective cesium adsorption resin material and its preparation method and application

An adsorption resin, unsaturated technology, applied in the field of high-speed selective cesium adsorption resin material and its preparation, to achieve high reaction efficiency, strong controllability, and good economic benefits

Inactive Publication Date: 2015-09-30
SHANGHAI JIAO TONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] At present, there is no relevant literature report that ammonium phosphomolybdate can be fixed on the surface of the adsorption material to prepare a cesium adsorption resin material with high-speed adsorption characteristics.

Method used

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  • A kind of high-speed selective cesium adsorption resin material and its preparation method and application
  • A kind of high-speed selective cesium adsorption resin material and its preparation method and application
  • A kind of high-speed selective cesium adsorption resin material and its preparation method and application

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] 1) Using crystalline cellulose microspheres (with an average diameter of about 200 microns and a crystallinity of 76%) as the polymer substrate, put 10 grams of the above material into a nitrogen-containing PE bag, and use an electron accelerator for electron beam radiation to make it Generates active free radicals that can be used in grafting reactions. Irradiation conditions: irradiation voltage 2MeV, irradiation dose 30kGy, dose rate 10kGy / pass.

[0038] 2) Immediately put the above particles after irradiation into an emulsion reaction system consisting of 30wt% GMA+3wt% polyoxyethylene sorbitan monolaurate (Tween20)+67wt% water for graft polymerization. The emulsification reaction system of GMA monomer was continuously blown with nitrogen for 30 minutes before use to remove the oxygen in the water. The graft polymerization reaction is carried out at 50°C, and the reaction is terminated after about 2 hours (the grafting rate of the substrate reaches about 250%).

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Embodiment 2

[0042] 1) Using polypropylene microsphere material (average diameter of 250 microns, crystallinity of 60%) as the polymer substrate, 10 grams of the above material and 1.5 g of azobisisobutyronitrile were added by 30wt% 4-HBAGE+70wt% The graft polymerization reaction was carried out in an organic solvent (about 50g) reaction system composed of acetone. The graft polymerization reaction was carried out at 60°C for 8 hours (the grafting rate of the substrate reached about 80%) to terminate the reaction.

[0043] 2) The above-mentioned 4-HBAGE monomer graft product, after washing and drying, put it into 5wt% ammonium phosphotungstate suspension aqueous solution for epoxy ring-opening reaction, and shake it at 80°C for 24 hours (ammonium phosphotungstate The introduction rate is about 15wt%), and the cesium adsorption resin material is obtained after taking out, washing and drying.

[0044] The adsorption resin material obtained by the above method has a diameter of about 300 mic...

Embodiment 3

[0046] 1. Static adsorption test of Cs adsorption resin material

[0047] Weigh 0.1 g of the adsorption material prepared in Example 1, and put it into 100 ml of an aqueous solution prepared by containing the stable isotope 133Cs at room temperature to perform a static Batch adsorption test. The Cs solution used in the adsorption test was prepared from 133Cs nitrate with an initial concentration of 5mg / L and a pH of 5.8. The above adsorption test was stirred at room temperature, and the adsorption time was different from 5 min to 60 min. The supernatant was recovered, and the residual Cs concentration was analyzed by atomic absorption spectrometry to calculate the adsorption amount.

[0048] From figure 2 It can be seen that the Cs adsorption resin obtained by the present invention has a very fast adsorption speed, basically reaching the adsorption equilibrium within 20 minutes, and has the characteristics of high-speed adsorption of Cs.

[0049] 2. Column pressure test of ...

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Abstract

The invention relates to a cesium adsorption material. The cesium adsorption material is an organic-inorganic composite resin material formed by reaction of a high-molecular material containing an epoxy group and a phosphorus heteropoly acid salt-containing inorganic material. A surface layer of the composite resin material is mainly inorganic constituents. According to the cesium adsorption material, an ion adsorbent is led into the surface of a high-molecular base material, and accordingly the grain size of the cesium adsorption material can reach 400 microns and requirements for industrial absorption column filling are satisfied; the cesium adsorption material has the advantages of being high in absorption speed, Cs attached to resin can be completely desorbed easily through eluent, the treated absorption resin can absorb the Cs again and can be reused, and the cesium adsorption material has good economical benefits.

Description

technical field [0001] The invention belongs to the technical field of cesium adsorption resin materials, in particular to a high-speed selective cesium adsorption resin material and its preparation method and application. Background technique [0002] Uranium-based nuclear fuel produces during fission 134 Cs and 137 Cs and other radionuclides, these radioactive Cs will emit strong γ-rays during the decay process, and the cesium in the high-level waste liquid needs to be separated and recovered in the nuclear fuel cycle treatment. Generally speaking, these radioactive Cs will not appear in the environment, and the recovery technology for the low-radioactive cesium in the environment has not been paid attention to. However, since the Fukushima nuclear power plant accident in Japan in March 2011, a large amount of radioactive Cs has leaked into the environment, posing a serious threat to living organisms. The development of radioactive Cs separation and recovery technology ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01J20/26B01J20/30G21F9/12
Inventor 赵龙
Owner SHANGHAI JIAO TONG UNIV
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