Manufacturing method for copper-based super-hydrophobic surface structure
A super-hydrophobic surface and copper-based technology, which is applied to the device for coating liquid on the surface, special surface, pre-treated surface, etc., can solve the problems of easy peeling off of the surface coating, poor performance and short time consumption, and achieve the goal of preparing The effect of short cycle, reduced preparation cost and convenient operation
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[0026] A method for preparing a copper-based superhydrophobic surface structure designed by the present invention, the main steps of the method include:
[0027] The first step is to pretreat the metal copper substrate;
[0028] In the second step, the surface of the copper substrate treated in the first step is spin-coated with a layer of photoresist, and the photoresist layer attached to the surface of the copper substrate is processed by photolithography to form an ordered porous array template;
[0029] In the third step, the copper substrate with an ordered porous array template prepared in the second step is used as the positive electrode, and immersed in CuSO 4 Form the primary battery in the solution and react for 4 to 8 minutes;
[0030] In the fourth step, the copper substrate after the galvanic reaction in the third step is immersed in AgNO 3 React in the solution for 30-70s;
[0031] In the fifth step, the surface of the copper substrate after the reaction in th...
Embodiment 1
[0043]Step 1: At room temperature, immerse the copper substrate in 20mmol / L dilute hydrochloric acid for 20s and take it out. After repeated several times, clean the surface with deionized water, and then ultrasonically clean it with acetone, absolute ethanol, and deionized water for 10 minutes. ;
[0044] In the second step, a layer of photoresist is spin-coated on the surface of the copper substrate pretreated in the first step, and after ultraviolet exposure, an ordered porous array template is formed on the surface of the copper substrate. The hole diameter on the ordered porous array template is 8 μm, and the pitch is 16μm, such as figure 1 shown;
[0045] Step 3: Prepare 0.2mol / L CuSO 4 Solution, seal the part of the copper substrate obtained in the second step that is exposed and has no ordered porous array template, and then use the copper substrate as the positive electrode and the zinc sheet of equal size as the negative electrode to keep the positive and negative ...
Embodiment 2
[0050] Step 1: At room temperature, immerse the copper substrate in 20mmol / L dilute hydrochloric acid for 20s and take it out. After repeated several times, clean the surface with deionized water, and then ultrasonically clean it with acetone, absolute ethanol, and deionized water for 10 minutes. ;
[0051] In the second step, a layer of photoresist is spin-coated on the surface of the copper substrate pretreated in the first step, and after ultraviolet exposure, an ordered porous array template is formed on the surface of the copper substrate. The hole diameter on the ordered porous array template is 8 μm, and the pitch is 12μm, such as figure 1 shown;
[0052] The third step is to prepare 0.5mol / L CuSO 4 Solution, seal the part of the copper substrate obtained in the second step that is exposed and has no ordered porous array template, and then use the copper substrate as the positive electrode and the zinc sheet as the negative electrode, so that the positive and negative...
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