High-heat-conductivity tungsten-copper heat sink and electronic packaging material, and preparation method thereof
An electronic packaging material, high thermal conductivity technology, applied in the direction of metal material coating process, circuit, electrical components, etc., can solve the problems of complicated preparation process of tungsten copper alloy, prolonged production cycle, increased cost, etc., to increase the bonding area And the effect of bonding force, production cost reduction, and high production efficiency
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Embodiment 1
[0036] Tungsten powder with a particle size of 10-80 μm and copper powder with a particle size of 20-100 μm are used, and the weight percentage of copper powder and tungsten powder is 30%: 70%, which is mechanically mixed in a ball mill for 12 hours and mixed evenly, and used as a mixed powder for spraying. After the T4 copper substrate is subjected to sandblasting treatment at a sandblasting pressure of 5Mpa, it is then placed in an ethanol solution for ultrasonic cleaning once for 10 minutes. Then take it out and dry it for 60 minutes at a temperature of 50° C., and use the sandblasted T4 copper as the substrate for spraying for later use.
[0037] Plasma spraying was carried out using a vacuum plasma spraying system from Sulzer Metco, Switzerland. Firstly, after reducing the vacuum degree of the vacuum chamber to below 10Pa, fill the protective gas with Ar gas to the set pressure. Under the plasma spraying process parameters shown in Table 2, the prepared composite powder ...
Embodiment 2
[0042] Tungsten powder with a particle size of 10-80 μm and copper powder with a particle size of 20-100 μm are used, and the weight percentage of copper powder and tungsten powder is 15%: 85% is mechanically mixed in a ball mill for 2 hours to mix evenly, and it is used as a mixed powder for spraying. After the T4 copper substrate is subjected to sandblasting treatment at a sandblasting pressure of 3Mpa, it is then put into an ethanol solution for ultrasonic cleaning twice, each cleaning time is 5 minutes. Then take it out and dry it at 100° C. for 20 minutes, and the sandblasted T4 copper substrate is used as the sprayed substrate for later use. Using the same vacuum plasma spraying process parameters as in Example 1, a tungsten-copper composite coating was prepared by spraying on the surface of the copper substrate, the coating thickness was about 200 μm, and the porosity was less than 1%. The room temperature thermal conductivity of the prepared composite material can reac...
Embodiment 3
[0044] Tungsten powder with a particle size of 10-80 μm and copper powder with a particle size of 20-100 μm are used, and the weight percentage of copper powder and tungsten powder is 10%: 90% is mechanically mixed in a ball mill for 8 hours to mix evenly, and it is used as a mixed powder for spraying. After the T1 copper substrate is subjected to sandblasting treatment at a sandblasting pressure of 3Mpa, it is then placed in an ethanol solution for ultrasonic cleaning once for 10 minutes. Then take it out and dry it for 40 minutes at a temperature of 80° C., and use the sandblasted copper alloy as a spraying substrate for later use.
[0045] Plasma spraying was carried out using a vacuum plasma spraying system from Sulzer Metco, Switzerland. Firstly, after reducing the vacuum degree of the vacuum chamber to below 10Pa, fill the protective gas with Ar gas to the set pressure. Under the plasma spraying process parameters shown in Table 3, the prepared composite powder was spra...
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