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Method for manufacturing large-sized high-density chromium target

A manufacturing method and compact technology, applied in the direction of ion implantation plating, coating, metal material coating process, etc., can solve the problems of lack of preparation process, etc., and achieve the effect of simplifying the process, avoiding stress release, and eliminating internal stress

Active Publication Date: 2012-09-19
YANTAI SHUODE NEW MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, for the preparation of large-scale high-density chromium targets, there is still a lack of mature and stable preparation processes

Method used

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Examples

Experimental program
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Effect test

specific Embodiment 1

[0033] A method for manufacturing a large-scale high-density chromium target, comprising the steps of:

[0034] Ⅰ. Vacuum degassing

[0035] Chromium powder with -200 mesh, 99.95% purity and less than 1000ppm oxygen content is used as raw material. First pressurize 5MPa to ensure that the powder will not overflow a lot during the vacuuming process, and keep the vacuum at 10 -3 Under the environment of Pa, fill it with argon, and raise the temperature to 800°C at a rate of 300°C / h.

[0036] Ⅱ. Stage temperature and pressure increase

[0037] In order to ensure that the flow and bonding of chromium materials are carried out in an orderly manner during the high-temperature sintering process, the hot-pressing process adopts a multi-stage temperature increase and pressure method to complete the sintering. Pressurize to 10MPa, then heat to 1100°C at a heating rate of 200°C / h, and keep warm for 1 hour to ensure uniform temperature distribution in the mold cavity. Finally, heat up...

specific Embodiment 2

[0051] A method for manufacturing a large-scale high-density chromium target, comprising the steps of:

[0052] Ⅰ. Vacuum degassing

[0053] Chromium powder with -200 mesh, 99.95% purity and less than 1000ppm oxygen content is used as raw material. First pressurize 5MPa to ensure that the powder will not overflow a lot during the vacuuming process, and keep the vacuum at 10 -3 Under the environment of Pa, heat to 800°C at a heating rate of 300°C / h and hold for 1 hour to reduce the molecular gas in the powder.

[0054] Ⅱ. Stage temperature and pressure increase

[0055] Pressurize to 10MPa, then heat to 1100°C at a heating rate of 200°C / h, and keep warm for 1 hour to ensure uniform temperature distribution in the mold cavity. Finally, heat up to 1400°C at a heating rate of 100°C / h, keep the temperature for 1 hour, and increase the pressure by 2MPa every 50°C during the temperature rise process, and the final pressure is 20MPa.

[0056] Ⅲ. Pressure holding furnace cooling

...

specific Embodiment 3

[0069] A method for manufacturing a large-scale high-density chromium target, comprising the steps of:

[0070] Ⅰ. Vacuum degassing

[0071] Chromium powder with -200 mesh, 99.95% purity and less than 1000ppm oxygen content is used as raw material. First pressurize 5MPa to ensure that the powder will not overflow a lot during the vacuuming process, and keep the vacuum at 10 -3 Under the environment of Pa, heat to 800°C at a heating rate of 300°C / h and hold for 1 hour to reduce the molecular gas in the powder.

[0072] Ⅱ. Stage temperature and pressure increase

[0073] In order to ensure that the flow and bonding of chromium materials are carried out in an orderly manner during the high-temperature sintering process, the hot-pressing process adopts a multi-stage temperature increase and pressure method to complete the sintering. Pressurize to 10MPa, then heat to 1400°C at a heating rate of 200°C / h, keep it warm for 1 hour, increase the pressure by 2MPa every 50°C during the...

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Abstract

The invention relates to a hot pressing method of a high-density chromium target. The method comprises the following seven sequential steps: vacuumizing, staged temperature and pressure increasing, pressure preserving furnace cooling, hot forging, annealing, hot rolling and machining. Through rationally designed process steps, stable technical parameters are selected so that the purpose of manufacturing the large-sized high-density chromium target at low cost is achieved.

Description

technical field [0001] The invention belongs to the technical field of new materials, and in particular relates to a method for manufacturing a chromium target. Background technique [0002] Metal chrome (Cr) is a slightly bluish silvery-white metal. Chromium has a strong passivation ability in the atmosphere and can maintain luster for a long time. Chromium has good corrosion resistance to various acids and strong alkalis, and has good chemical stability. Chromium also has the characteristics of high hardness and high resistivity. Due to the various properties of chromium, chromium and its alloys or compound films prepared by various surface technologies are widely used in surface engineering, such as: mechanical functional film, microelectronic film, electromagnetic functional film, optical film, decorative function membrane etc. With the development of high-tech, high-purity chromium sputtering targets with different performance and requirements need to be used in the ...

Claims

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Application Information

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IPC IPC(8): C23C14/34C23C14/14B22F3/16
Inventor 王广欣钟小亮豆帆
Owner YANTAI SHUODE NEW MATERIAL
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