Special weather-proof perforated mulching film for full-film covering and double-ridge furrow sowing
A full-film covering and weather-resistant technology, applied in the direction of plant protection cover, can solve problems such as policy incompatibility and pollution, and achieve the effect of promoting scientific development, improving ecological environment, and promoting harmonious development.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0019] Embodiment 1, a weather-resistant perforated mulch film specially used for full-film covering double furrows, is made of the following raw materials in weight percentage: LLDPE 70%, wherein the melt flow rate g / 10min is 2.0-3.0 LLDPE 50%, melted Volume flow rate g / 10min is 1.0-2.0 LLDPE 20%, LDPE 10%, HDPE 6%, mPE 10%, anti-aging masterbatch 4%.
Embodiment 2
[0020] Embodiment 2, a weather-resistant perforated mulch film specially used for full-film covering double furrows, is made of the following raw materials in weight percentage: LLDPE 60%, wherein the melt flow rate g / 10min is 2.0-3.0 LLDPE 45%, melted Volume flow rate g / 10min is 1.0-2.0 LLDPE 15%, LDPE 15%, HDPE 4%, mPE 15%, anti-aging masterbatch 6%.
Embodiment 3
[0021] Embodiment 3, a weather-resistant perforated mulch film specially used for full-film covering double furrows, is made of the following raw materials in weight percentage: LLDPE 65%, wherein the melt flow rate g / 10min is 2.0-3.0 LLDPE 47%, melt The volume flow rate g / 10min is 1.0-2.0 LLDPE 18%, LDPE 12%, HDPE 8%, mPE 12%, anti-aging masterbatch 3%.
PUM
Property | Measurement | Unit |
---|---|---|
melt flow index | aaaaa | aaaaa |
melt flow index | aaaaa | aaaaa |
melt flow index | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com