Preparation method for anti-reflective glass

Abstract

A preparation method for anti-reflective glass includes the steps of cleaning a silicate glass substrate, pre-treating the cleaned silicate glass substrate by means of laser, etching the pre-treated silicate glass substrate which is immersed into etching water liquor prior to cleaning, drying and the like, and obtaining the anti-reflective glass. The preparation method for the anti-reflective glass has the advantages that the technology is simple, anti-reflective effect is controllable, and glass surface subjected to laser pretreatment is not only quick and uniform in etched speed, but also capable of effectively increasing a laser induced damage threshold of the etched glass.

Description

technical field [0001] The invention relates to anti-reflection glass, in particular to a preparation method of anti-reflection glass. Background technique [0002] The traditional method to reduce the reflectivity of the glass surface is to coat the glass surface with a single-layer or multi-layer anti-reflection film. This traditional anti-reflection method has many problems: complex preparation process, high cost, poor adhesion and stability, The low laser damage threshold limits the application prospect of anti-reflection optical glass. Studies in recent decades have shown that directly etching a nanoscale porous structure on the glass surface can achieve a gradual change in refractive index from the air layer to the glass substrate, thereby effectively suppressing the reflectivity of the glass surface. At present, the method of reactive ion beam (RIE) is mainly used to process nano-sized microstructures. This method requires special reaction equipment and needs to add ...

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Problems solved by technology

[0002]The traditional method to reduce the reflectivity of the glass surface is to coat the glass surface with a single-layer or multi-layer anti-reflection film. There are many traditional anti-reflection methods Problems: complex preparation process, high cost, poor adhesion, poor stability, low laser damage threshold, etc., limit the application prospects of anti-reflection optical glass

At present, the method of reactive ion beam (RIE) is mainly used to process nano-sized microstructures. This method requires special reaction equipment and needs to add different reaction gases according to different materials. At the same time, parameters such as temperature, time, and flow rate are adjusted. Complex and expensive to process

And prepare anti-reflection layer on glass surface with chemical method then cost is low, simple to operate, as strong acid solution etching method (USPatent 2348704), phase separation method (US Patent 4086074), neutral solution method (US Patent 4434191; L.M.Cook, W.H.Lowdermilk, D.Milam, and J.E.Swain, Antireflective surfaces for high-energy laser optics formed by neutral-solution processing, Applied Optics, Vol.21, No.8 / 15April 1982), etc., where the strong acid method is due to the presence of fluorine in the solution Ions have certain pollution to the environment, and are easy to produce large corrosion pits on the glass surface, increasing light scattering; while the phase separation method can only be used for glasses with two different phases, and the anti-reflection band is also narrow; The neutral solution method NaHAsO adopted by L.M.Cook et al. 4 Harmful to the human body, the most important thing is that the etching speed is slow

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