Aluminum film-containing etching solution for liquid crystal display screen

Abstract

The invention discloses aluminum film-containing etching solution for a liquid crystal display screen. The etching solution comprises 20 to 42 weight percent of phosphoric acid, 0.65 to 20 weight percent of nitric acid, 0.01 to 5 weight percent of nonionic surfactant, 0.5 to 15 weight percent of organic acid salt and the balance of water. The etching solution can etch the aluminum film or the aluminum alloy film with excellent controllability to obtain the metal film with the proper conical shape and flat and smooth surface.

Description

technical field [0001] The invention relates to an etching solution for an aluminum-containing film of a liquid crystal display. Background technique [0002] In the manufacturing process of the liquid crystal display device, multi-layer wiring needs to be performed on the surface of the glass substrate through multiple photolithography processes. Generally speaking, a complete photolithography process needs to be composed of the following steps. [0003] ·Cleaning and metal coating process. The glass substrate is put into, cleaned, and dried. The glass substrate is cleaned with a cleaning machine and dried; the metal film is sputtered as the gate material, and the metal film can be aluminum film or aluminum alloy film. [0004] ·Glue-coating process: use a glue-coating machine to coat the photoresist with ultraviolet light drying on the treated metal film. The thickness of the photoresist film is generally controlled at (15000±500) about. [0005] ·Photoresist curing ...

AI Technical Summary

Problems solved by technology

When the tapered shape at the desired angle cannot be obtained, it may cause breakage of the upper layer wiring

[0012] At present, the etching liquid containing aluminum film of liquid crystal display screen mainly has the following three disadvantages: first, the etching angle of the aluminum film or aluminum alloy film etching liquid is difficult to control, which cannot meet the customer's requirements for the angle of the positive cone shape, and the use effect is not good. Affect product yield; second, it is difficult to control the amount of etching of the metal layer by the aluminum film or aluminum alloy film etching solution, which cannot meet the customer's requirements for the angle of the positive cone shape, and it is easy to etch too much. There are also etching marks caused by the infiltration of etching solution on the interface between the layer and the metal film, thereby reducing the product yield; third, the aluminum film or aluminum alloy film etching solution chemically reacts with the metal film during the etching process, and the generated hydrogen gas tiny bubbles The solution is adsorbed by the metal film, resulting in rough or even cracked metal film surface after etching

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