Manufacturing Method Of Multicolor Dimming Masking And Pattern Transfer Printing Method

A manufacturing method and photomask technology, which can be applied to the photolithographic process of the patterned surface, the original for photomechanical processing, semiconductor/solid-state device manufacturing, etc., which can solve the problems of uneven film reduction speed and difficult film reduction Shape control, large density difference of resist pattern, etc., to achieve the effect of improving in-plane uniformity and forming accuracy

Inactive Publication Date: 2014-07-16
HOYA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, it is difficult to accurately control the shape of the subtractive film, which sometimes leads to a decrease in the formation accuracy of the transfer pattern
Especially in photomasks for FPDs, the density difference of the resist pattern is large, so there is a tendency that the film-reducing speed is uneven

Method used

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  • Manufacturing Method Of Multicolor Dimming Masking And Pattern Transfer Printing Method
  • Manufacturing Method Of Multicolor Dimming Masking And Pattern Transfer Printing Method
  • Manufacturing Method Of Multicolor Dimming Masking And Pattern Transfer Printing Method

Examples

Experimental program
Comparison scheme
Effect test

no. 1 Embodiment approach

[0052] Below, refer to figure 1 and figure 2 The first embodiment of the present invention will be described. figure 1 It is a flowchart of the manufacturing process of the multi-color photomask 10 of this 1st Embodiment. figure 2 It is a cross-sectional view showing a pattern transfer method using the multi-color photomask 10 .

[0053] (1) Manufacturing method of multi-color photomask

[0054] (Photomask blank preparation process)

[0055] First, if figure 1 As illustrated in (a), a photomask blank 10b is prepared. The photomask blank 10b has a semitransparent film 101 and a light shielding film 102 sequentially formed on a transparent substrate 100, and a resist film 102 is formed on the uppermost layer. Dose film 103.

[0056] The transparent substrate 100 is, for example, constituted as a flat plate made of quartz (SiO 2 ) glass, or containing SiO 2 、Al 2 o 3 , B 2 o 3 , RO (R is an alkaline earth metal), R 2 O(R 2 It is composed of low-expansion glass suc...

no. 2 Embodiment approach

[0097] Next, use image 3 A second embodiment of the present invention will be described. In the first embodiment, the subtraction of the first resist pattern 103p is performed in a state where the light semi-transmissive film 101 is left in the formation region of the light-transmitting portion 120 and the light semi-transmissive film 101 is exposed. However, in the second embodiment, the subtraction of the first resist pattern 103p is performed by disposing a provisional resist pattern in the formation region of the light-transmitting portion 120 and exposing the resist pattern. That is, the difference between the second embodiment and the above-mentioned first embodiment is that when the first resist pattern 103p is formed, a tentative pattern (tentative resist pattern ) 103d, subtracting the first resist pattern 103p while consuming a part of active oxygen by the resist film 103 constituting the provisional pattern 103d. Below, refer to image 3 Differences from the fir...

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Abstract

The invention provides a manufacturing method of a multicolor dimming masking and a patter transfer printing method. By the invention, not only the patterning times and developing times can be reduced by utilizing the film depression of slushing compound pattern, but also the uniformity of the film depression of the slushing compound pattern between dense areas. The manufacturing method includes the steps of forming a first slushing compound pattern covering a forming area of a shading part and a forming area of a semi-transmission part, wherein the thickness of the slushing compound film in the forming area of the semi-transmission part is smaller than the thickness of slushing compound film in the forming area of the shading part; and supplying active oxygen to the first slushing compound pattern to conduct film depression to the first slushing compound pattern. And part of the active oxygen supplied to the first slushing compound pattern is consumed by an exposed semi-transmission film.

Description

technical field [0001] The present invention relates to a method of manufacturing a multi-color photomask used in the manufacture of a flat panel display (Flat Panel Display: hereinafter referred to as FPD) such as a liquid crystal display device, etc., and a method of pattern transfer using the multi-color photomask . Background technique [0002] For example, a thin film transistor (Thin Film Transistor: hereinafter referred to as TFT) substrate for FPD uses a photomask in which a transfer pattern consisting of a light-shielding portion and a light-transmitting portion is formed on a transparent substrate. produced by photolithography process. In recent years, in order to reduce the number of photolithography steps, a multi-color photomask in which a transfer pattern including a light-shielding portion, a semi-transmitting portion, and a light-transmitting portion is formed on a transparent substrate has been used. [0003] In the above-mentioned multi-color light mask, ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/68G03F1/80G03F1/56G03F7/20G03F7/00G03F1/00
CPCG03F1/68G03F1/80G03F7/2063H01L21/0275H01L21/0337
Inventor 长岛奖
Owner HOYA CORP
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