Method for depositing silicon membrane for solar cell on basis of magnetic control sputtering technology
A solar cell and magnetron sputtering technology, which is applied in sputtering plating, ion implantation plating, coating, etc., can solve the problem of complex safety control process, difficulty in precise control of hydrogen content, and dense structure of amorphous silicon film. Improve the density and deposition rate, facilitate control, and lower the investment threshold
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Embodiment 1
[0024] The equipment used in this embodiment mainly includes magnetron sputtering equipment. The vacuum chamber of the magnetron sputtering equipment includes at least one working vacuum chamber and a plurality of auxiliary vacuum chambers connected to both sides of the working vacuum chamber. A high-purity solid silicon target is set in the chamber, and a tooling frame is installed horizontally through the entire vacuum chamber, and a driving device is connected to the tooling frame. The driving device is used to drive the tooling frame to make a continuous straight line along the direction of the vacuum chamber in the vacuum chamber. sports.
[0025] A method of depositing a silicon thin film for solar cells based on magnetron sputtering technology of the present invention, specifically comprises the following steps:
[0026] Step 1: Select conductive glass as the substrate, and perform pre-cleaning treatment on the substrate.
[0027] The specific method for pretreatment c...
Embodiment 2
[0035] The equipment used in this embodiment is the same as in Embodiment 1.
[0036] A method of depositing a silicon thin film for solar cells based on magnetron sputtering technology of the present invention, specifically comprises the following steps:
[0037] Step 1: Select a durable and flexible polymer material as the base material, specifically select plastic with electrodes pre-plated as the base material, and perform pre-cleaning treatment on the base material.
[0038] The specific method for pretreatment cleaning of the substrate is: put the substrate in a solution containing a cleaning agent, and perform ultrasonic cleaning to remove stains on the surface of the substrate; then put the substrate in deionized water, and perform ultrasonic cleaning to remove residual detergent and dry with hot air.
[0039] Step 2: Place the substrate cleaned before step 1 on the tooling frame, and control the distance between the substrate on the tooling frame and the silicon targ...
Embodiment 3
[0045] The equipment used in this embodiment is the same as in Embodiment 1.
[0046] A method of depositing a silicon thin film for solar cells based on magnetron sputtering technology of the present invention, specifically comprises the following steps:
[0047] Step 1: Select conductive glass as the substrate, and perform pre-cleaning treatment on the substrate.
[0048] The specific method for pretreatment cleaning of the substrate is: place the substrate in a solution containing a cleaning agent, and clean it with a mechanical brush to remove stains on the surface of the substrate; then put the substrate in deionized water and ultrasonically clean it to Remove residual cleaning agent and dry with hot air.
[0049] Step 2: Place the substrate cleaned before step 1 on the tooling rack, and control the distance between the substrate on the tooling rack and the silicon target to be 110 mm. The substrate is sent to the vacuum chamber of the magnetron sputtering equipment throu...
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