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Electrostatic chuck

An electrostatic chuck and electric power technology, which is applied to holding devices, circuits, and electrical components using electrostatic attraction, can solve the problems of large-scale internal power supply, pollution leakage current of peripheral equipment, etc. The effect of reducing failures

Active Publication Date: 2011-08-17
CREATIVE TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, there is also the problem of increasing the size of the internal power supply in order to ensure sufficient power, and there are also concerns about contamination of peripheral equipment including the electrostatic chuck by liquid leakage from the rechargeable battery, and the influence of leakage currents, etc.

Method used

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Examples

Experimental program
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Embodiment Construction

[0025] Next, preferred embodiments of the present invention will be specifically described with reference to the drawings. In addition, this invention is not limited to the following description.

[0026] figure 1 It is a schematic cross-sectional view showing a state in which a silicon wafer w is sucked and held by using the electrostatic chuck 8 of the present invention in a parallel plate type plasma etching apparatus 11 and an etching process of the silicon wafer w is performed. In the electrostatic chuck 8 according to this embodiment, the electrode sheet 5 is pasted on the upper surface side of an aluminum metal base 1 with a thickness of 12 mm and a diameter of 340 mm. The electrode sheet 5 is formed by stacking the lower insulating layer 2 and the upper insulating layer 4 composed of a polyimide film with a thickness of 100 μm and a diameter of 298 mm on the upper and lower surfaces of the adsorption electrode 3, wherein the adsorption electrode 3 is made of copper wi...

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PUM

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Abstract

Provided is a self power feeding electrostatic chuck (8) which can feed power that an attracting electrode (3) uses, while generating power during a time when substrate is being processed. An electrostatic chuck (8) holds the substrate by attraction in a substrate processing apparatus (11) which processes the substrate by generating optical energy. The electrostatic chuck has an electrode sheet (5) provided with the attracting electrode (3), a metal base (1) having the electrode sheet (5) stacked on the upper surface side, an internal power supply which obtains power to be supplied to the attracting electrode (3), and a voltage increasing circuit (7) which increases the voltage of the power obtained by the internal power supply. The internal power supply is a solar cell (6), and the electrostatic chuck (8) converts optical energy into power while the substrate is being processed, and the substrate is held by attracting the substrate to the electrode sheet (5).

Description

technical field [0001] The present invention relates to an electrostatic chuck with an internal power supply. Background technique [0002] In semiconductor manufacturing processes such as ion implantation equipment, ion doping equipment, and plasma immersion equipment, exposure equipment using electron beams, extreme ultraviolet (EUV) lithography, etc., wafer inspection equipment such as silicon wafers, etc. Electrostatic chucks are used in various devices to attract and hold semiconductor substrates. In addition, in the field of liquid crystal production, electrostatic chucks are used for attracting and holding insulating substrates in substrate lamination equipment and ion doping equipment used for pressing liquid crystals into glass substrates and the like. [0003] In general, an electrostatic chuck is formed by laminating an electrode sheet that adsorbs a substrate such as a semiconductor substrate or a glass substrate on the upper surface side of a metal base. Then,...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/683H02N13/00
CPCH01L21/6833H02N13/00
Inventor 辰己良昭藤泽博
Owner CREATIVE TECH CORP
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