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Radiation-sensitive composition, protective film and inter layer insulating film, and method for forming the same

A radiation-sensitive technology, applied in the field of protective film and interlayer insulating film, can solve problems such as peeling, insufficient adhesion of transparent conductive film, cracks in cured film, etc., and achieve cost-effective effects

Active Publication Date: 2014-07-02
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, polysiloxane-based materials and ITO (indium tin oxide) transparent conductive films have insufficient adhesion, and cracks (cracks) tend to occur on the cured film, so there is a problem that it is not suitable as a protective film.
In addition, the adhesion of the protective film to metal wiring such as molybdenum (Mo), tungsten (W), titanium (Ti), tantalum (Ta), niobium (Nb), copper (Cu), and aluminum (Al) in the display element If insufficient, the protective film may be cracked or peeled off starting from the wiring

Method used

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  • Radiation-sensitive composition, protective film and inter layer insulating film, and method for forming the same
  • Radiation-sensitive composition, protective film and inter layer insulating film, and method for forming the same
  • Radiation-sensitive composition, protective film and inter layer insulating film, and method for forming the same

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0145]As the solvent that can be used for the preparation of the radiation-sensitive composition, a solvent that uniformly dissolves or disperses each component and does not react with each component is suitably used. Examples of such solvents include ethers, diethylene glycol alkyl ethers, ethylene glycol alkyl ether acetates, propylene glycol monoalkyl ethers, propylene glycol monoalkyl ether acetates, propylene glycol monoalkane Ether propionates, aromatic hydrocarbons, ketones, esters, etc.

[0146] Examples of these solvents include:

[0147] As ethers are, for example, tetrahydrofuran, etc.;

[0148] Examples of diethylene glycol alkyl ethers include diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol Alcohol ethyl methyl ether, etc.;

[0149] Examples of glycol alkyl ether acetates are methyl cellosolve acetate, ethyl cellosolve acetate, ethylene glycol monobutyl e...

Synthetic example 1

[0187]In a container with a stirrer, add 25 parts by mass of propylene glycol monomethyl ether, then add 30 parts by mass of methyltrimethoxysilane, 23 parts by mass of phenyltrimethoxysilane and 0.1 parts by mass of tetraisopropoxy aluminum , heated to a solution temperature of 60°C. After the solution temperature reached 60°C, 18 parts by mass of ion-exchanged water was added, heated to 75°C, and kept for 3 hours. Next, 28 parts by mass of methyl orthoformate was added as a dehydrating agent, and stirred for 1 hour. Then, the temperature of the solution was set at 40° C., and the solution was evaporated while maintaining the temperature to remove water and methanol produced by hydrolytic condensation. As above, the hydrolysis-condensation product (A-1) was obtained. The solid content concentration of the hydrolytic condensate (A-1) was 40.5% by mass, the number average molecular weight (Mn) of the obtained hydrolytic condensate was 1,500, and the molecular weight distribut...

Synthetic example 2

[0189] In a container with a stirrer, add 25 parts by mass of propylene glycol monomethyl ether, then add 22 parts by mass of methyltrimethoxysilane, 12 parts by mass of γ-glycidoxypropyltrimethoxysilane, 20 parts by mass of Phenyltrimethoxysilane and 0.01 parts by mass of triethylamine were used in the same manner as in Synthesis Example 1 to obtain a hydrolysis-condensation product (A-2). The solid content concentration of the hydrolytic condensate (A-2) was 39.8% by mass, the number average molecular weight (Mn) of the obtained hydrolytic condensate was 1,300, and the molecular weight distribution (Mw / Mn) was 2.2.

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Abstract

The invention relates to a radiation-sensitive composition, a protective film, an interlayer insulating film and a method for forming those. The radiation-sensitive composition is suitable for forming the protective film and the interlayer insulating film which satisfy such generally required properties as transparency, heat-resistant transparency and surface hardness and have high cracking resistance and high adhesion to an ITO transparent conductive film and metal wiring of molybdenum or the like even under severe conditions of high temperature and high humidity. The radiation-sensitive composition comprises [A] a siloxane polymer, [B] a polymer comprising a repeating unit represented by a general formula (1) (wherein R1 is an alkyl group with a hydrogen or carbon number 1-4; R2-R6 are respectively an alkyl group with a hydrogen, hydroxy or carbon number 1- 4; B is a single bond, -Coo-* or -CONH-* ; m is an integer of 0 to 3; at least one of R2-R6 is a hydroxy group, -COO-* or each connection bond of the * in the -CONH-* and carbon connection with (CH2)m, and [C] a radiation-sensitive acid generator or a radiation-sensitive base generator.

Description

technical field [0001] The present invention relates to a radiation-sensitive composition suitable as a material for forming a protective film and an interlayer insulating film for display elements such as a liquid crystal display element (LCD) and an organic EL display element (OLED), and a protective film formed from the composition and an interlayer insulating film, and a method for forming the protective film and the interlayer insulating film. Background technique [0002] A display element is dipped in a solvent, an acid or an alkali solution, or the like in its manufacturing process. In addition, in such a display element, when the wiring electrode layer is formed by sputtering, a part of the element surface is exposed to high temperature. Therefore, in order to prevent the display element from being deteriorated or damaged due to such immersion treatment with a solvent or the like and high-temperature treatment, a protective film resistant to these treatments may be...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004G03F7/027G03F7/075G03F7/00
Inventor 上田二朗藤冈昌泰露木亮太
Owner JSR CORPORATIOON
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