Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Bidirectional triode thyristor auxiliarily triggered by POMS field effect transistor

A technology of field-effect transistors and polysilicon gates, applied in the field of bidirectional thyristors, can solve the problems of ineffective chip protection and high trigger voltage, and achieve the effects of small occupied layout area, low turn-on voltage and good robustness

Inactive Publication Date: 2011-12-14
ZHEJIANG UNIV
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the SCR trigger voltage is generally high, and it cannot effectively protect chips with an operating voltage of 5V and below.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Bidirectional triode thyristor auxiliarily triggered by POMS field effect transistor
  • Bidirectional triode thyristor auxiliarily triggered by POMS field effect transistor
  • Bidirectional triode thyristor auxiliarily triggered by POMS field effect transistor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0021] Such as image 3 with Figure 4 As shown, a triac triggered by a PMOS field effect transistor includes a 4-layer structure, wherein the bottom layer is a P-type substrate 31, and the second layer is a deep N well 33a arranged on the P-type substrate 31. The N well 33a is provided with an N well 33b, a first P well 32a and a second P well 32b, wherein the first P well 32a and the second P well 32b are located on both sides of the N well 33b, and the deep N well 33a covers the P substrate 31 is separated from the first P well 32a and the second P well 32b.

[0022] The third layer is two N+ implant regions and two P+ implant regions arranged above the well region, wherein the first N+ implant region 34a and the second N+ implant region 34b are respectively arranged in the first P well 32a and the second P well 32b above and on the outside, the first P+ implantation region 36a and the second P+ implantation region 36b are on the inside, wherein the first P+ implantation ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a bidirectional triode thyristor auxiliarily triggered by a P-channel metal oxide semiconductor (POMS) field effect transistor. The bidirectional triode thyristor comprises a P-type substrate; a deep N trap is formed on the P-type substrate; an N trap, and a first P trap and a second P trap which are positioned on the two sides of the N trap are formed in the deep N trap; a first N+ injection region and a first P+ injection region which are separated by a first shallow ditch are formed on the first P trap; the first P+ injection region is positioned on the inner side and crosses the junction of the first P trap and the N trap; a second N+ injection region and a second P+ injection region which are separated by a second shallow ditch are formed on the second P trap;the second P+ injection region is positioned on the inner side and crosses the junction of the second P trap and the N trap; and laminated gate oxides and polysilicon gates are coated on the surface of the N trap between the first P+ injection region and the second P+ injection region. The silicon controlled thyristor can be auxiliarily triggered by a POMS tube, has a small start voltage, a simple structure, small occupied layout area, high robustness, and high starting speed and can provide a bidirectional current path.

Description

technical field [0001] The invention relates to the technical field of integrated circuits, in particular to a triac triggered by a PMOS field effect transistor. Background technique [0002] The phenomenon of electrostatic discharge (ESD) in nature is an important factor affecting the reliability of integrated circuits. In the industry, 30% of the failures of integrated circuit products are caused by electrostatic discharge phenomena, and with the continuous advancement of chip processing technology, thinner gate oxide layer thickness and smaller device sizes have made integrated circuits subject to The chances of electrostatic discharge damage are greatly increased. Therefore, improving the reliability of integrated circuit electrostatic discharge protection has a non-negligible effect on improving the yield of products. [0003] The modes of electrostatic discharge phenomena are usually divided into four types: HBM (Human Body Model), MM (Machine Discharge Model), CDM (...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L29/74H01L29/06H01L27/07
CPCH01L29/747
Inventor 马飞韩雁董树荣宋波苗萌李明亮吴健郑剑锋
Owner ZHEJIANG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products