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Multi-ion-beam sputter-deposition technology for doping with diamond-like carbon (DLC) coating

An ion beam sputtering and diamond technology, applied in the field of multi-ion beam sputtering deposition, can solve the problems of increasing the friction coefficient of the DLC coating, increasing the brittleness of the DLC coating, and deteriorating the thermal stability of the DLC coating, etc. The effect of improving overall performance

Inactive Publication Date: 2010-07-28
CHINA UNIV OF GEOSCIENCES (BEIJING)
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

By doping W, Ti, Cr, Zr, Cu, Si, F and other elements in the DLC coating to form a multi-component multi-phase structure based on the amorphous carbon film, the comprehensive performance of the DLC film can be significantly improved; but doping There are also some problems with a single element, such as doping tungsten will increase the friction coefficient of the DLC coating, doping titanium will increase the brittleness of the DLC coating, and doping F will cause the thermal stability of the DLC coating to deteriorate; in order to further improve the DLC coating The performance of the coating needs to achieve the complementary advantages of different doping elements through the doping of multiple elements in the DLC coating. However, a multi-component doping technology for DLC coatings suitable for industrial mass production has not yet been developed.
[0004] The process parameters of multi-ion beam sputtering deposition technology can be strictly controlled, and the prepared DLC film has excellent mechanical properties. It is an ideal method for synthesizing high-performance DLC coatings. Literature report

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] First, ultrasonic cleaning technology is used to remove the contamination layer on the surface of the workpiece; then, the surface of the workpiece is bombarded and cleaned by the argon ion beam generated by the Kaufman ion source to obtain an atomically clean surface. Then use ion beam assisted sputtering deposition technology to prepare Ti / TiN / TiCN / TiC gradient transition layer; the sputtering ion source adopts Kaufman ion source, the ion energy is 2000eV, the beam current is 100mA, and the sputtering target is titanium; The deposition ion source adopts the Kaufmann ion source, and argon, argon / nitrogen mixed gas, argon / nitrogen / methane mixed gas, argon / methane mixed gas are introduced into the auxiliary deposition ion source successively, and the ion energy is 100- 300eV, the beam current is 100mA. Finally, a Ti and Si co-doped DLC coating was prepared by multi-ion beam sputtering + low-energy ion beam-assisted deposition; a Kaufman ion source was used to sputter a g...

Embodiment 2

[0027] First, ultrasonic cleaning technology is used to remove the contamination layer on the surface of the workpiece; then, the surface of the workpiece is bombarded and cleaned by the argon ion beam generated by the Kaufman ion source to obtain an atomically clean surface. Then use ion beam assisted sputtering deposition technology to prepare Cr / CrN / CrCN / CrC gradient transition layer; the sputtering ion source adopts Kaufman ion source, the ion energy is 2000eV, the beam current is 100mA, and the sputtering target is chromium; The deposition ion source adopts the Kaufmann ion source, and argon, argon / nitrogen mixed gas, argon / nitrogen / methane mixed gas, argon / methane mixed gas are introduced into the auxiliary deposition ion source successively, and the ion energy is 100- 300eV, the beam current is 100mA. Finally, a Cr and F co-doped DLC coating was prepared by multi-ion beam sputtering + low-energy ion beam-assisted deposition; a Kaufman ion source was used to sputter a gr...

Embodiment 3

[0029] First, ultrasonic cleaning technology is used to remove the contamination layer on the surface of the workpiece; then, the surface of the workpiece is bombarded and cleaned by the argon ion beam generated by the Kaufman ion source to obtain an atomically clean surface. Then use ion beam assisted sputtering deposition technology to prepare Cr / CrN / CrCN / CrC gradient transition layer; the sputtering ion source adopts Kaufman ion source, the ion energy is 2000eV, the beam current is 100mA, and the sputtering target is chromium; The deposition ion source adopts the Kaufmann ion source, and argon, argon / nitrogen mixed gas, argon / nitrogen / methane mixed gas, argon / methane mixed gas are introduced into the auxiliary deposition ion source successively, and the ion energy is 100- 300eV, the beam current is 100mA. Finally, WS was prepared by multiple ion beam sputtering + low energy ion beam assisted deposition method 2 , Si co-doped DLC film; use a Kaufmann ion source to sputter g...

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Abstract

The invention relates to a multi-ion-beam sputter-deposition technology for doping a diamond-like carbon (DLC) coating. The technology is characterized by comprising the following steps of: firstly, washing to removing a polluted layer on the surface of a workpiece by utilizing ultrasonic waves, and carrying out ion beam bombardment washing on the surface of the workpiece by utilizing an argon-ion beam generated by an ion source to obtain an atomic scale clean surface; then preparing a gradient transition layer by utilizing an auxiliary ion beam sputter-deposition method; and finally, synthesizing a multi-element doped DLC coating on the gradient transition layer by utilizing multi-ion-beam sputtering and low-energy ion beam auxiliary deposition. In the process of synthesizing the multi-element doped DLC coating by utilizing the multi-ion-beam sputtering and the low-energy ion beam auxiliary deposition, carbon particles and metallic particles which are generated by bombarding a graphite target and a metallic target are deposited by using a sputtering ion source, and gas ions generated by an auxiliary deposition ion source continuously bombard the surface of a grown film layer to regulate and control the microstructure of the film layer and realize multi-element doping.

Description

Technical field: [0001] The patent of the invention relates to a multi-ion beam sputtering deposition technology for preparing doped diamond-like carbon (DLC) coating, which belongs to the composite preparation technology of high-performance DLC coating materials. Background technique: [0002] Diamond-like carbon coatings have high hardness, high elastic modulus, excellent friction and wear properties, chemical stability and biocompatibility, and have very broad application prospects. However, large internal stress, poor film / substrate bonding force, poor thermal stability, and high brittleness limit the application of DLC coatings in harsh service conditions. [0003] The use of the transition layer can overcome the problem of large differences in structure and performance at the film / substrate interface, relieve the internal stress of the DLC film and improve the film / substrate bonding force of the DLC coating. By doping W, Ti, Cr, Zr, Cu, Si, F and other elements in the...

Claims

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Application Information

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IPC IPC(8): C23C14/34C23C14/06C23C14/02
Inventor 付志强王成彪岳文彭志坚于翔
Owner CHINA UNIV OF GEOSCIENCES (BEIJING)
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