Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Photo- and/or thermo-curable copolymer, curable resin compositions, and cured articles

A thermosetting, copolymer technology, applied in the field of cured products, can solve the problems of inability to obtain curable resin and increased viscosity of resin solution, and achieve the effects of excellent storage stability, good curing characteristics, and excellent solvent resistance

Active Publication Date: 2010-03-03
DAICEL CORP
View PDF2 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This is because, when an epoxy compound having a polymerizable unsaturated group is reacted with a vinyl polymer having an epoxy group and a carboxyl group on the side chain, usually the epoxy group originally present in the vinyl polymer Reacts with the carboxyl group in the vinyl polymer. During the reaction, gelation occurs or the viscosity of the resin solution increases, so that the desired curable resin cannot be obtained

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photo- and/or thermo-curable copolymer, curable resin compositions, and cured articles
  • Photo- and/or thermo-curable copolymer, curable resin compositions, and cured articles
  • Photo- and/or thermo-curable copolymer, curable resin compositions, and cured articles

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0144] Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited by these examples. The weight-average molecular weight and degree of dispersion of the copolymer were measured by GPC (gel permeation chromatography; polystyrene conversion).

[0145] (Synthesis of Copolymer)

preparation example 1

[0147] Add 130 g of methoxybutyl acetate and 110 g of methoxybutanol to a separable flask with an internal volume of 1 liter of a stirrer, a thermometer, a reflux condenser, a dropping funnel, and a nitrogen introduction pipe, and heat up to 80° C. Add 85g of methacrylic acid, 265g of 3,4-epoxytricyclo [5.2.1.0] dropwise over a period of 5 hours. 2,6 ]decane-9-yl acrylate and 3,4-epoxytricyclo[5.2.1.0 2,6 ] a mixture of decan-8-yl acrylate [50:50 (molar ratio)] [the compound represented by the above-mentioned formula (9), Ra'=H], and 30 g of azobisdimethylvaleronitrile dissolved in 380 g of acetic acid The mixed solution obtained in methoxybutyl ester was further aged for 3 hours to obtain a copolymer (P-1) having a carboxyl group. The reaction was carried out under nitrogen flow. The obtained copolymer had a solid content of 35.4% by weight, an acid value of 158KOH mg / g, a weight average molecular weight (Mw) of 11200, and a degree of dispersion of 1.96.

preparation example 2

[0149] Add 130 g of methoxybutyl acetate and 110 g of methoxybutanol to a separable flask with an internal volume of 1 liter of a stirrer, a thermometer, a reflux condenser, a dropping funnel, and a nitrogen introduction pipe, and heat up to 80° C. 45 g of methacrylic acid, 131 g of ω-carboxy-polycaprolactone monoacrylate (Aronics (Aronics) M5300: manufactured by Toagosei Co., Ltd.), 173 g of 3,4-epoxytricyclic [5.2.1.0 2,6 ]decane-9-yl acrylate and 3,4-epoxytricyclo[5.2.1.0 2,6 ] a mixture of decan-8-yl acrylate [50:50 (molar ratio)] [the compound represented by the above-mentioned formula (9), Ra'=H], and 30 g of azobisdimethylvaleronitrile dissolved in 380 g of acetic acid The mixed solution obtained in methoxybutyl ester was further aged for 3 hours to obtain a copolymer (P-2) having a carboxyl group. The reaction was carried out under nitrogen flow. The obtained copolymer had a solid content of 35.5% by weight, an acid value of 154KOH mg / g, a weight average molecular w...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
acid valueaaaaaaaaaa
molecular weightaaaaaaaaaa
weight-average molecular weightaaaaaaaaaa
Login to View More

Abstract

A photo- and / or thermo-curable copolymer having polymerizable unsaturated groups in side chains, prepared from both a copolymer (P) comprising monomer units derived from a carboxyl-containing polymerizable unsaturated compound (A) and monomer units derived from at least one epoxy-containing polymerizable unsaturated compound (B) represented by the general formula (1) or (2) and an epoxy-containingpolymerizable unsaturated compound (C) through addition reaction of part of the carboxyl groups of the copolymer (P) with the epoxy group of the compound (C) (wherein R's are each hydrogen or alkyl having 1 to 4 carbon atoms; and R's are each a single bond or C1-12 alkylene which may contain a heteroatom). The curable copolymer exhibits excellent synthesis stability and storage stability and excellent curing characteristics and permits both epoxy crosslinking and radical crosslinking.

Description

technical field [0001] The present invention relates to a photo- and / or thermosetting copolymer having a carboxyl group, an epoxy group, and a polymerizable unsaturated group on a side chain, a curable resin composition containing the photo- and / or thermosetting copolymer, and A cured product obtained by curing the curable resin composition. The above-mentioned photo- and / or thermosetting copolymer and curable resin composition containing the photo- and / or thermosetting copolymer are used as alkali resists (soda resist) for printed wiring boards and resists for optical waveguides. photo spacer, overcoat, color resist, black matrix, insulating film, etc. material is useful. Background technique [0002] In general, in the field of manufacturing various electronic devices that require sub-micron microfabrication represented by VLSI, there is an increasing demand for higher density and higher integration of devices. Therefore, the requirements for photolithography as a fine ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C08F8/14C08F299/00C08F290/12C08G59/32
CPCC08F299/00C08G59/4246C08F8/14C08F220/00C08F290/12C08G59/32
Inventor 高胁浩一二十轩年彦
Owner DAICEL CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products