Method for preparing neuro chip by taking polylactic acid as substrate
A neural chip and polylactic acid technology, which is applied in photoplate-making process coating equipment, micro-lithography exposure equipment, photoplate-making process exposure devices, etc., can solve the problem that single-crystal silicon wafers do not have biocompatibility and affect the working life of chips, etc. problem, to achieve the effect of stable working life, prolonging life, and strong biocompatibility
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[0024] Embodiments of the present invention are described in detail below in conjunction with the accompanying drawings: this implementation is carried out under the premise of the technical solution of the present invention, and detailed implementation methods and specific operating procedures have been provided, but the protection scope of the present invention is not limited to the following the described embodiment.
[0025] Such as figure 1 As shown, it is a process flow diagram of the present invention, wherein: a is to spin coat a layer of photoresist on the polylactic acid substrate; b is to carry out UV exposure to the photoresist after spin coating; after c exposure, the device is put into developing solution, remove the unexposed photoresist part; d is to etch a circular hole on the polylactic acid substrate with NaOH etchant; e is sputtering gold; f is removing the exposed photoresist from the sputtered gold device At the same time, the sputtered gold on the photo...
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