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Float online production method for low radiation film glass

A low-emissivity film and production method technology, applied in the field of float glass, can solve problems such as difficult control and complicated process, and achieve the effects of fast decomposition speed, good film layer uniformity and low emissivity

Inactive Publication Date: 2009-07-08
CSG HOLDING
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, Chinese invention patent CN97190763.3 discloses a method for online production of low-emissivity film glass by chemical vapor deposition process float method. This method uses a gasified reactant mixture as a coating material, and uses a hot carrier gas flow to disperse or flow Vaporization of organic tin powder can also inject the solvated organic tin compound into the hot carrier gas flow. The reaction gas flow of organic tin includes organic tin, oxidant, inert gas, etc., but the reaction substances involved in this method require high temperature The instant decomposition reaction is not easy to control, and the process is more complicated

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] In the production line of float glass, an atmosphere control room is set at the exit of the tin bath, and in the atmosphere control room, the precursor gas mixture composed of silicon source, oxygen source, ethylene, inert gas, etc. The surface of the coated glass flows; the surface of the glass is stable at about 650°C, and the pulling speed of the glass ribbon is controlled at 480m / h; the concentration of silicon source is 12%, the concentration of ethylene is 99%, and the concentration of oxygen source is 20 %, using an inert gas as a carrier, depositing a shielding layer with a refractive index of about 1.50 and a thickness of 50 nm.

[0036] The glass ribbon that has been deposited with the shielding layer is introduced into the front end of the annealing furnace, and a reactor with a single-channel inlet structure is set above it, and trifluoroacetic acid, monobutyl tin trichloride, antimony trichloride, triethyl phosphorus A precursor gas mixture is formed, nitro...

Embodiment 2

[0039] In the production line of float glass, an atmosphere control room is set at the exit of the tin bath, and in the atmosphere control room, the precursor gas mixture composed of silicon source, oxygen source, ethylene, inert gas, etc. The surface of the coated glass flows; the surface of the glass is stable at about 610°C, and the pulling speed of the glass ribbon is controlled at 480m / h; the concentration of silicon source is 10%, the concentration of ethylene is 100%, and the concentration of oxygen source is 18 %, with an inert gas as a carrier, a shielding layer with a refractive index of about 1.49 and a thickness of 40 nm is deposited.

[0040] The glass ribbon that has been deposited with the shielding layer is introduced into the front end of the annealing furnace, and a reactor with a single-channel inlet structure is set above it, and phosphorus trifluoride, butyltin trichloride, antimony tribromide, and triethyl phosphate are formed Plastid gas mixture, with ai...

Embodiment 3

[0043] In the production line of float glass, an atmosphere control room is set at the exit of the tin bath, and in the atmosphere control room, the precursor gas mixture composed of silicon source, oxygen source, ethylene, inert gas, etc. The surface of the coated glass flows; the surface of the glass is stable at about 680°C, and the pulling speed of the glass ribbon is controlled at 480m / h; the concentration of silicon source is 18%, the concentration of ethylene is 95%, and the concentration of oxygen source is 12 %, with an inert gas as a diluent gas, a shielding layer with a refractive index of about 1.48 and a thickness of 85 nm was deposited.

[0044] The glass ribbon that has been deposited with the shielding layer is introduced into the front end of the annealing furnace, and a reactor with a single-channel inlet structure is set above it, and trifluorotoluene, dibutyltin dichloride, antimony trichloride, and phosphorus trichloride are used as precursors A solid gas ...

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Abstract

The invention relates to a float online method for producing low-radiation film glass. The method comprises that: on a float glass production line, molten glass liquid floats in a tin groove and moves and is gradually cooled to form a glass strip; the glass strip leaves the tin groove and enters an atmosphere control chamber; in the atmosphere control chamber, a proplastid gas mixture consisting of silane, an oxygenous source and ethene uses inert gas as a carrier and is deposited on the surface of the float glass strip to form a shielding layer at speed of more than 300 / s by an atmospheric pressure chemical vapor deposition method; the glass deposited with the shielding layer is transported to an annealing furnace; the atomized proplastid gas mixture containing a tin source, a stibium source, a fluorine source, a phosphorus source, a catalyst and a stabilizing agent is introduced to the surface of the float glass strip deposited with the shielding layer in a region with a temperature of between 540 and 610 DEG C of the annealing furnace; and taking nitrogen gas as a carrier, a film layer with low radiation performance is formed on the glass strip plated with the shielding layer through pyrolysis reaction at speed of more than 300 / s.

Description

【Technical field】 [0001] The invention relates to the field of float glass, in particular to a float on-line production method of low-emissivity film glass. 【Background technique】 [0002] Low-emissivity coated glass is also called Low-emissivity (Low-E) coated glass, which is characterized by allowing the heat radiation part of the solar energy to enter the room, and reflecting most of the heat radiation emitted by indoor heating and indoor objects back to the room, ensuring The indoor heat is not lost to the outside, thereby saving heating costs; at the same time, it also has high visible light transmittance and low visible light reflectance, avoiding light pollution. [0003] Coating low-emissivity film on glass, such as tin dioxide film, can be used to change the radiation and reflection characteristics of glass to mid- and far-infrared rays. However, if the low-emissivity film is directly coated on the glass surface, since the alkali metal ions inside the glass are eas...

Claims

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Application Information

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IPC IPC(8): C03C17/34C03B18/02
Inventor 王杏娟谭小安刘建党
Owner CSG HOLDING
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