Method for online production of TCO film glass by float process
A float glass and thin film technology, which is applied in the field of float glass on-line production of transparent conductive oxide thin film glass, can solve the problems of limited wide use, complicated preparation process, low natural reserves, etc. Efficient effect
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Embodiment 1
[0036] Example 1: Phosphorous-doped silicon dioxide film is used as the base film, and the coating area is in the tin bath; and the aluminum-doped zinc oxide film is used as the functional film, and the coating area is at the front end of the annealing kiln.
[0037] In the tin tank of the float glass production line, a reactor is set above the glass ribbon, which is used to dilute the precursor gas mixture of silane, ethylene, phosphine, and carbon dioxide with inert gas as the carrier gas, and direct it along the surface to be coated. The inner surface flows; the temperature of the glass ribbon is 655-675°C, and the pulling speed of the glass ribbon is 430m / h; the volume ratio of the precursor gas is: silane: ethylene: phosphine: carbon dioxide = 1:7:0.003:5, nitrogen or argon Gas is used as the diluting gas; the concentrations of various gases after dilution are 10 mol% of silane, 99 mol% of ethylene, 20 mol% of carbon dioxide, and 1 mol% of phosphine; the shielding layer is...
Embodiment 2
[0040] Example 2: the phosphorus-doped silicon dioxide film is used as the base film, and the coating area is in the tin bath; while the aluminum-doped zinc oxide film is used as the functional film, and the coating area is at the front end of the annealing kiln.
[0041] In the tin tank of the float glass production line, a reactor is set above the glass ribbon, which is used to dilute the precursor gas mixture of silane, ethylene, trimethyl phosphate, and nitrogen oxide with inert gas as the carrier gas, and direct it along the required The inner and outer surfaces of the coating flow; the temperature of the glass ribbon is 675-695°C, and the pulling speed of the glass ribbon is 430m / h; the volume ratio of the precursor gas is: silane: ethylene: trimethyl phosphate: nitrogen oxide = 0.5:1:0.001 : 4. Nitrogen or argon is used as the diluent gas; wherein the concentrations of various gases after dilution are 15 mol% of silane, 100 mol% of ethylene, 20 mol% of nitrogen oxide, an...
Embodiment 3
[0044] Example 3: the phosphorous-doped silicon dioxide film is used as the base film, and the coating area is at the tin bath; and the aluminum-doped zinc oxide film is used as the functional film, and the coating area is at the end of the tin bath.
[0045] In the tin tank of the float glass production line, a reactor is set above the glass ribbon, which is used to dilute the precursor gas mixture of silane, ethylene, phosphorus oxychloride, and nitrogen oxide with inert gas as the carrier gas, and direct it along the required The inner and outer surfaces of the coating flow; the temperature of the glass ribbon is 655-675°C, and the pulling speed of the glass ribbon is 430m / h; the volume ratio of the precursor gas is: silane: ethylene: phosphorus oxychloride: nitrogen oxide = 20:14:0.05 :9, nitrogen or argon as a diluent gas; wherein the concentrations of various gases after dilution are respectively 10 mol% of silane, 80 mol% of ethylene, 10 mol% of phosphorus oxychloride, a...
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