Anneal technique for improving battery electrical property
A technology of annealing process and electrical performance, applied in circuits, electrical components, climate sustainability, etc., can solve the problems of increasing contact resistance, difficult to optimize sub-processes, and difficult to optimize passivation temperature process, and achieve equipment Low investment, high production efficiency, and the effect of improving battery electrical performance
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Embodiment 1
[0011] A 125×125mm monocrystalline cell manufactured by using low-frequency PECVD (PECVD generator frequency is 40kHz) to deposit silicon nitride anti-reflection film and manufacture based on screen printing is placed in a diffusion furnace tube (gas flow can be controlled) for annealing treatment, annealing The temperature is 370°C, the annealing time is 18min, the annealing atmosphere is a mixed gas of nitrogen and hydrogen, V H2 :V N2 =5:27, the efficiency change after annealing is shown in Table 1.
[0012]
Embodiment 2
[0014] A 156×156mm polycrystalline cell manufactured by using low-frequency PECVD (the PECVD generator frequency is 40kHz) to deposit silicon nitride anti-reflection film and manufacture based on screen printing is annealed in a diffusion furnace tube (the gas flow can be controlled), and the annealing temperature is The temperature is 330°C, the annealing time is 35min, the annealing atmosphere is a mixed gas of nitrogen and hydrogen, V H2 :V N2 =1:9, the efficiency change after annealing is shown in Table 2
[0015] Table 2
[0016]
Embodiment 3
[0018] A 156×156mm polycrystalline cell manufactured by using low-frequency PECVD (the PECVD generator frequency is 40kHz) to deposit silicon nitride anti-reflection film and manufacture based on screen printing is annealed in a diffusion furnace tube (the gas flow can be controlled), and the annealing temperature is The temperature is 395°C, the annealing time is 18min, and the annealing atmosphere is a mixed gas of nitrogen and hydrogen, V H2 :V N2 =1:9, the change in efficiency after annealing is shown in Table 3.
[0019] table 3
[0020]
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