LCD substrate, LCD and manufacturing method

Abstract

The invention discloses a liquid crystal display device baseboard, comprising a baseboard, a gate line, a gate electrode, a gate insulation layer, an active layer, a resistance contact layer, a source cathode, a drain electrode and a data line, wherein the data line and the gate line are crossed to define a pixel region, a passive layer is formed above the source and the drain electrodes and the data line, a contact hole is formed above the source cathode of the source and the drain electrodes, a black matrix layer is formed at the region outside the pixel region, a resin layer is formed on the passive layer of the pixel region and exposes the contact hole on the passive layer, an pixel electrode is formed on the resin layer and is connected with the source cathode of the source and the drain electrodes via the contact hole. The invention further discloses a production method of the liquid crystal display device baseboard, a liquid crystal display device and a production method thereof. The invention modifies the CF coating form and coating technique of the prior CF-on-TFT technique, to restrain the bad conduction of liquid crystal display devices, improve processing reliability and improve the display property of TFT baseboards.

Description

Technical field [0001] The present invention relates to a thin film transistor liquid crystal display, in particular to a substrate for a liquid crystal display in which a color filter layer is formed on one side of an array substrate of a thin film transistor, and a liquid crystal display using the substrate and a manufacturing method thereof. Background technique [0002] In the prior art, an active matrix type liquid crystal display (Liquid Crystal Display; LCD) that uses a thin film transistor (TFT) as a switching element has proposed a TFT-LCD such as an anti-staggered type. In recent years, in order to achieve a wide aperture ratio, it has also been proposed to use an LCD with a color filter (CF) (or CF-on-TFT) structure formed on the side of an array substrate where switching elements such as TFTs are formed. On such a substrate with a CF-on-TFT structure, the resin-coated color filter layer and its protective layer (OC) are usually directly etched away to form contact hol...

AI Technical Summary

Problems solved by technology

Although the source-drain electrode contact hole 22 can be formed into a forward taper in the process, so that the transparent pixel electrode 21 can reduce the occurrence of disconnection, the thickness of the transparent pixel electrode 21 is generally only , and the slope angle 28 at the contact hole and the interlayer end difference are too large, therefore, it is still very easy for the transparent pixel electrode 21 to break at the source-drain electrode contact hole 22, so that the transparent pixel electrode cannot be normally conducted. The screen cannot be displayed normally

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