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Photomask data generation method, photomask generation method, exposure method, and device manufacturing method

A technology of original and data, applied in the field of original data generation, can solve the problem of not discussing the method of exposure equipment output

Active Publication Date: 2009-01-28
CANON KK
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  • Claims
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Problems solved by technology

[0009] Although Japanese Patent Application Laid-Open Publication No. 2004-221594 discusses an auxiliary pattern arranging method for improving the depth of focus and an auxiliary pattern arranging method for improving exposure likelihood, there is no discussion about the method for improving the yield of the exposure apparatus. method

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  • Photomask data generation method, photomask generation method, exposure method, and device manufacturing method
  • Photomask data generation method, photomask generation method, exposure method, and device manufacturing method
  • Photomask data generation method, photomask generation method, exposure method, and device manufacturing method

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Embodiment Construction

[0024] Various exemplary embodiments, features, and aspects of the invention will now be described in detail with reference to the accompanying drawings. The relative arrangement of components, numerical expressions, and numerical values ​​set forth in these examples are not intended to limit the scope of the present invention unless explicitly stated.

[0025] Concepts according to exemplary embodiments of the present invention may be expressed as hardware or placed in a mathematical model. Accordingly, the exemplary embodiments of the present invention can be installed in a computer system as a program.

[0026] The software function of the computer system according to the present exemplary embodiment includes a program having a computer-executable program code, and can determine a pattern of a mask as a master, generating master data. The software codes may be stored as one or more modules on at least one storage medium such as a machine readable medium or a memory. Exemp...

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Abstract

The present invention relates to a photomask data generation method, photomask generation method, exposure method, and device manufacturing method. A method for generating original plate data includes calculating a two-dimensional transmission cross coefficient based on a function indicating an intensity distribution of light formed on a pupil plane of a projection optical system with illumination light and a pupil function for the projection optical system, calculating an approximate aerial image obtained by approximating an aerial image on an image plane of the projection optical system by at least one component of a plurality of components of the aerial image based on the two-dimensional transmission cross coefficient and a first pattern on an object plane of the projection optical system, generating a further pattern having the first pattern on the object plane and auxiliary patterns based on the approximate aerial image, and generating original plate data including a pattern generated by repeating the calculating and generating processing by using the further pattern as the first pattern on the object plane.

Description

technical field [0001] The present invention generally relates to master data generation methods, master generation methods, exposure methods, and device manufacturing methods. Background technique [0002] Exposure equipment is used in photolithography processes for manufacturing semiconductor devices such as integrated circuits (ICs). The exposure equipment illuminates the original plate (also called “mask” or “reticle”), and exposes the circuit pattern drawn on the original plate onto the substrate (wafer) through the projection optical system. [0003] It is desired to simplify the semiconductor device manufacturing process and improve the performance of exposure equipment. [0004] In the exposure equipment, as an index of the performance of the exposure equipment, resolution indicating how fine a pattern can be formed on a substrate, and throughput indicated by the number of substrates that can be fully exposed per unit time are used. As a method for improving the th...

Claims

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Application Information

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IPC IPC(8): G03F1/14G03F7/20H01L21/027G03F1/68G03F1/70
CPCG03F1/36G03F1/144G03F7/70441
Inventor 山添贤治
Owner CANON KK
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