Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Porous polymer membrane, method for producing same, and method for manufacturing stamper used for production of same

A technology of polymer film and manufacturing method, which can be used in nanostructure manufacturing, semiconductor/solid-state device manufacturing, anodizing and other directions, and can solve problems such as difficulty in manufacturing large-area concave-convex patterns.

Inactive Publication Date: 2008-08-20
KANAGAWA ACADEMY SCI & TECH
View PDF2 Cites 28 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since electron beam lithography (electron beamlithography) is generally used in the manufacture of molds used in nanoimprinting, these methods have the problem that it is difficult to produce fine concave-convex patterns of 100 nm or less in large areas.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Porous polymer membrane, method for producing same, and method for manufacturing stamper used for production of same
  • Porous polymer membrane, method for producing same, and method for manufacturing stamper used for production of same
  • Porous polymer membrane, method for producing same, and method for manufacturing stamper used for production of same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0071] Example 1 [Manufacture of Porous Polymer Membrane Using a Stamper Produced Using Anodized Porous Alumina as a Casting Mold]

[0072] An aluminum plate with a purity of 99.99% was subjected to electrolytic polishing in a mixed solution of perchloric acid and ethanol (volume ratio 1:4). The mirror-finished aluminum plate was anodized in an aqueous solution of oxalic acid adjusted to a concentration of 0.3M, and then anodized for 15 hours at a bath temperature of 17°C and a direct current of 40V. Anodized in seconds, thereby forming anodized porous alumina with a pore depth of 150nm. Thereafter, the sample was immersed in a 5% by weight phosphoric acid aqueous solution for 30 minutes, and a pore diameter expanding treatment was performed to adjust the pore size to 70 nm. Ni electrodeposition was performed after coating 50 nm of Pt-Pd on this surface using a sputtering apparatus. The mold was then removed by dissolving in an aqueous solution of sodium hydroxide, thereby o...

Embodiment 2

[0073] Example 2 [Manufacture of polymethyl methacrylate (PMMA) porous film by thermal imprint method using a stamper with controlled protrusion shape]

[0074] On the surface of an aluminum plate with a purity of 99.99%, a SiC mold having a structure in which protrusions are regularly arranged at a period of 200 nm is pressed to form a fine concave-convex pattern on the surface. The texturing-treated aluminum plate was anodized for 2 seconds in an oxalic acid aqueous solution adjusted to a concentration of 0.05 M under conditions of a bath temperature of 17° C. and a direct current of 80 V. Then, it was immersed in 10 weight% phosphoric acid aqueous solution for 25 minutes, and the pore diameter expansion process was implemented. This operation was repeated five times to obtain a porous alumina having tapered pores with a pore period of 200 nm, a pore opening of 200 nm, a bottom of 50 nm, and a pore depth of 300 nm. Ni electrodeposition was performed after coating the surfac...

Embodiment 3

[0075] Example 3 [Manufacture of acrylic porous film by photoimprint method using a stamper with controlled protrusion shape]

[0076] Ultraviolet irradiation was performed in a state in which a Ni stamper manufactured by the same method as in Example 2 was pressed into the acrylic monomer dropped on the glass substrate. After the monomer was cured, the stamper was peeled off, thereby producing a porous acrylic resin film on the substrate. The electron micrograph (the figure observed with the electron microscope) of the surface of the produced acrylic resin porous film (porous polymer film 8) is shown in FIG. 8, and the cross-sectional electron micrograph (the figure observed with the electron microscope) is Figure 9 shows.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

By filling the pores of anodized porous alumina having a porous surface structure with a substance, and dissolving and removing the aforementioned anodized porous alumina, a stamper having an inverse structure of the aforementioned substance and having the aforementioned surface structure is manufactured. The aforementioned reverse structure of the aforementioned stamper is transferred to the polymer to manufacture a porous polymer film having the aforementioned surface structure. A large-area porous polymer membrane can be produced without complicated steps, and the porous polymer membrane has a surface structure in which pores of uniform size are perpendicular to the membrane surface.

Description

technical field [0001] The present invention relates to a porous polymer film and a method for producing the same, in particular to a method for producing a porous polymer film in which a fine concave-convex structure such as a porous structure or a hole array structure is transferred to the surface using a stamper, and The method produces a porous polymer film having a concave-convex structure such as a porous structure or a pore matrix structure on the surface, and further relates to a method for producing a stamper used in the production of the porous polymer film. [0002] This application claims priority based on Japanese Patent Application No. 2005-245702 filed with Japan Patent Office on August 26, 2005 and Japanese Patent Application No. 2006-059103 filed with Japan Patent Office on March 6, 2006, the contents of which are incorporated herein. Background technique [0003] A polymer film having a submicron-nano-level fine concavo-convex structure on its surface is ex...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C25D1/00B29C59/02B82B3/00C25D11/04H01L21/027
Inventor 益田秀树柳下崇西尾和之
Owner KANAGAWA ACADEMY SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products