LAYERED GaAs, METHOD OF PREPARING SAME, AND GaAs NANOSHEET EXFOLIATED FROM SAME
a nanosheet and gallium arsenide technology, applied in the field of layered gallium arsenide (gaas), can solve the problems of high limit in research on 2d materials, limited possibility of low-dimensional material development, and high cost, and achieve easy exfoliation into nanosheets, excellent electrical properties, and easy charge transport
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preparation example 1
Preparation of Layered K2Ga2As3
[0074]A predetermined amount of K powder was mixed with a predetermined amount of Ga powder and As powder, and the mixtxure was sealed in a quart tube in an inert gas atmosphere. The quartz tube containing the sample was heat-treated for 10 hours at 750° C. Afterwards, the tube was cooled at a cooling rate of 0.5 to 3° C. / hr for K2Ga2As3 recrystallization, thereby obtaining a K2Ga2As3 single crystal having a monoclinic crystal structure with the P21 / c space group.
preparation example 2
Preparation of Layered Na2Ga2As3
[0075]A predetermined amount of Na powder was mixed with a predetermined amount of Ga powder and As powder, and the mixture was sealed in a quartz tube in an inert gas atmosphere. The quartz tube containing the sample was heat-treated for 10 hours at 750° C. Afterwards, the tube was cooled at a cooling rate of 1° C. / hr for Na2Ga2As3 recrystallization, thereby obtaining a Na2Ga2As3 single crystal having a monoclinic crystal structure with the P21 / c space group.
example 1
Preparation of Layered GaAs
[0076]The K2Ga2As3 prepared in Preparation Example 1 was mixed with deionized water, ethanol, and AlCl3 to remove K ions therefrom, and after washed with deionized water to remove KCl, layered GaAs having an amorphous structure was obtained.
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