Coloring composition, coloring radiation-sensitive composition, color filter and solid-state imaging device

Abstract

Disclosed is a coloring composition with satisfactory heat resistance, no discoloration, excellent developability, and no development residues on a substrate and pixels of other colors, providing, a coloring composition for a color filter including (A) a polymer having a dye skeleton and (B) an organic solvent, wherein the content of an unreacted monomer component having the dye skeleton which is capable of forming (A) the polymer having the dye skeleton is less than or equal to 1 mass % with regard to (A) the polymer having the dye skeleton.

Description

BACKGROUND OF THE INVENTION[0001]1. Technical Field[0002]The present invention relates to a coloring composition, a coloring radiation-sensitive composition, a production method of a polymer, a pattern forming method, a color filter and a production method thereof, and a solid-state imaging device.[0003]2. Background Art[0004]As production methods of color filters used in liquid crystal displays or solid-state imaging devices, a dyeing method, a printing method, an electrodeposition method, and a pigment dispersion method are known.[0005]Of these, the pigment dispersion method is a method in which a color filter is produced by photolithography using a coloring radiation-sensitive composition in which a pigment is dispersed in various radiation-sensitive compositions, and has an advantage of being stable to light, heat or the like since pigments are used. Positional accuracy is also high since patterning is carried out by photolithography, therefore, the method is widely used as a su...

AI Technical Summary

Benefits of technology

This patent provides a coloring composition that is resistant to heat and does not change color. The composition also has good developability and does not leave any residues on the substrate or other pixels. The patent also describes a method for producing a polymer with a dye skeleton, a method for using the coloring composition to form patterns, a color filter, and a method for producing the solid-state imaging device.

Problems solved by technology

However, in recent years, high definition has become more required in color filters for solid-state imaging devices, and there have been problems with conventional pigment dispersion methods such that resolution is not improved and color irregularity occurs due to coarse particles of the pigments.

Therefore, conventional pigment methods are not suitable for applications in which color filters having fine patterns such as a solid-state imaging device are required.

In order to solve such problems, the use of dyes has been proposed, however, radiation-sensitive compositions containing dyes have new problems (see, for example, Patent Document 1).

That is, (1) Common dyes have low solubility in either an aqueous alkali solution or an organic solution, therefore, it is difficult to obtain a liquid radiation-sensitive composition of a target spectrum.

(2) Dyes are often shown to interact with other components in a radiation-sensitive composition, therefore, it is difficult to adjust solubility (developability) of the cured area and non-cured area.

(3) When a molar extinction coefficient (e) of a dye is low, a large amount of dye needs to be added, resulting in problems such as lowering a curing property of the composition, heat resistance after curing, developability of a non-cured area or the like since the amount of other components such as a polymerizable compound, a binder, or a photopolymerization initiator in the radiation-sensitive composition has to be reduced.

(4) Dyes are generally inferior in light resistance and heat resistance compared to pigments.

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