Integrated micro electro-mechanical system and manufacturing method thereof

Abstract

In the manufacturing technology of an integrated MEMS in which a semiconductor integrated circuit (CMOS or the like) and a micro machine are monolithically integrated on a semiconductor substrate, a technology capable of manufacturing the integrated MEMS without using a special process different from the normal manufacturing technology of a semiconductor integrated circuit is provided. A MEMS structure is formed together with an integrated circuit by using the CMOS integrated circuit process. For example, when forming an acceleration sensor, a structure composed of a movable mass, an elastic beam and a fixed beam is formed by using the CMOS interconnect technology. Thereafter, an interlayer dielectric and the like are etched by using the CMOS process to form a cavity. Then, fine holes used in the etching are sealed with a dielectric.

Description

CROSS REFERENCE TO RELATED APPLICATIONS[0001]This application is a Continuation of nonprovisional U.S. application Ser. No. 12 / 216,359 filed Jul. 2, 2008, which is a Continuation of nonprovisional U.S. application Ser. No. 11 / 208,740 filed Aug. 23, 2005. Priority is claimed based on U.S. application Ser. No. 12 / 216,359 filed Jul. 2, 2008, which claims the priority of U.S. application Ser. No. 11 / 208,740 filed Aug. 23, 2005, which claims the priority of Japanese Patent Application JP 2005-050541 filed on Feb. 25, 2005 and Japanese Patent Application JP 2005-226233 filed on Aug. 4, 2005, the contents of which are hereby incorporated by reference into this application.TECHNICAL FIELD OF THE INVENTION[0002]The present invention relates to micro electro-mechanical systems (MEMS) and a manufacturing method thereof. More particularly, the present invention relates to a technology effectively applied to an integrated micro electro-mechanical system in which a semiconductor integrated circui...

AI Technical Summary

Benefits of technology

[0018]Also, another object of the present invention is to provide a technology capable of easily manufacturing a mass with a sufficient mass required in an acceleration sensor and a gyroscope at low cost, in the manufacturing technology of an integrated MEMS including an acceleration sensor or a gyroscope.

[0019]Also, still another object of the present invention is to provide a technology capable of simplifying a manufacturing process of an integrated MEMS to reduce the manufacturing cost of a product.

[0028]In addition, the second primary characteristic of the present invention is that, by forming one integral mechanical structure (including a mass and a movable part considered as a mechanically integral structure) using a plurality of LSI layers or interconnect layers, a movable mass with a sufficient mass required in an acceleration sensor and a gyroscope can be formed through the standard interconnect process of the CMOS process. The movable part of the mechanical structure is preferably formed in a cavity and is fixed to an interlayer dielectric surrounding the cavity by a (elastically) deformable LSI material or metal interconnects. The mechanical structure is designed so that the mechanical characteristics thereof are determined based on the dimensions of the structure itself and do not depend on the shape of the cavity. More specifically, the mechanical structure is provided with (1) a fixed part which is fixed to an interlayer dielectric surrounding a cavity and has an enough size substantially considered to be elastically undeformed, (2) a movable part and (3) an elastically deformable part which connects the fixed part and the movable part. By doing so, the dimensional accuracy of the cavity does not influence the mechanical characteristics of the MEMS. Therefore, the high dimensional accuracy of the cavity is not required in comparison to the case where the mechanical characteristics of the structure depend on the shape of the cavity. Usually, the dimensional accuracy of the structure is defined with the accuracy of the interconnect pattern of a LSI. Since this dimensional accuracy is generally much higher than the process accuracy of the bulk MEMS in the conventional technology, the highly accurate mechanical characteristics can be assured.

[0029]Since the structure is formed by using the interconnect layers, the structure itself has not only the mechanical function as a mass but also the electrical function as an electrode and an interconnect. The actuation and the sensing are performed by the electrostatic force and capacitance between the electrically independent electrode fixed to an interlayer dielectric and a movable part also functioning as an electrode. By using the movable part of the integral structure as a mass, for example, an acceleration sensor and a vibration gyroscope (angle rate sensor) are realized. The mechanical connection between the movable part and the surrounding interlayer dielectric (fixed part and elastically deformable part, for example, beam) and the electrical connection (interconnect, actuator capacitor and detecting capacitor) can be made through separate layers constituting the LSI. By sandwiching the movable part between the multilayer interconnects to restrict the movable range of the movable part, it becomes possible to improve the reliability.

[0032]Since a LSI (including CMOS) and a MEMS can be monolithically integrated through the standard CMOS process (LSI process), it is possible to achieve the miniaturization and the cost reduction of the integrated MEMS.

Problems solved by technology

As described above, when the MEMS is used in combination with the signal processing LSI, since each of them is formed on the separate chips, the miniaturization of the entire system is difficult.

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